SUSS MicroTec

ACS 200 Gen 3

Lithography SUSS MicroTec ACS 200 family

Research Quality: 40% complete

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ACS 200 Gen 3 — Inventory photo — Fig. 01ACS 200 Gen 3Inventory photo^[1]

Plate 01Coater developer (Suss ACS200Gen3) at uSIC, Tohoku University
Micro System Integration Center(uSIC), Tohoku UnivWatch on YouTube

Power

50 Hz Compatible Model^[1]

Gas delivery

4 developers^[5]

How it works

The wafer transfer system of the ACS 200 Gen 3 uses a dual-arm end effector manufactured by Nidec Sankyo.^[1]

What do the numbers mean?

Power & electrical1

Set-up Transformer: 50 Hz Compatible Model^[1]

Wafer handling7

Cassette Stations (4): Compatible with Open Cassettes^[1]
Wafer Transfer System: Dual-Arm (Nidec Sankyo) End Effector^[1]
Pre-Aligner: Equipped with Orientation flat/notch postition rotation for both opague (Si water) & transparent (glass water)substrates^[1]
Wafer Sizes: 2, 3, 4, 5, 6, 8, 12 inch^[1]
Max Wafer Size (product detail): up to 8 inch^[1]
Cassette Stations: 4 (compatible with Open Cassettes)^[1]
Pre-Aligner: Equipped with Orientation flat/notch position rotation for both opaque & transparent substrates^[1]

Gas & chemistry7

4 developers^[5]
Coaters & Developers Vintage: 2019(inventory listing)
Coaters & Developers Vintage: 2022(inventory listing)
Coaters & Developers Vintage: 2013(inventory listing)
Coaters & Developers Vintage: 2021(inventory listing)
Coaters & Developers Vintage: 2018(inventory listing)
Configuration (variant): Coater/Developer with 4 developers, 4D setup^[5]

Configuration & options17

Bake Plate (8):^[1]; Supports Proximity Bake^[1]
Temp: 60-250 Deg C^[1]; Cool Plate (3):^[1]
Temp: 18-25 Deg C^[1]; Proximity supported^[1]; Configured with a 4D setup^[5]; New monitor^[5]; No keyboard^[5]
Vintage: 2019(inventory listing)
Vintage: 2022(inventory listing)
Vintage: 2013(inventory listing)
Vintage: 2021(inventory listing)
Vintage: 2018(inventory listing)
- # of develop line each bowl: 2:DEV (binary , fan spray), 2: DI (binary, fan spray), 1:N2(inventory listing)
Bake Plates: 8, supports proximity bake, temperature 60-250 °C^[1]
Cool Plates: 3, temperature 18-25 °C, proximity supported^[1]

Vintage & configurations

Documented models & variants

Designation	Generation	Vintage	Changes	Source
ACS 200 Gen 3 Coater/Developer	Gen 3	2017	Configured as a coater/developer system with 4 developers and a 4D setup	Equipment inventory listing^[5]

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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

Set-up Transformer50 Hz Compatible Model^[1]
Configuration4 developers^[5]
Coaters & Developers Vintage2019
Coaters & Developers Vintage2022
Coaters & Developers Vintage2013
Coaters & Developers Vintage2021
Coaters & Developers Vintage2018
Configuration (variant)Coater/Developer with 4 developers, 4D setup^[5]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What is the role of photoresist in this class of machine?General reference — not yet source-verified

Photoresist is the light-sensitive film that receives the pattern. Exposure changes its chemical behavior, allowing selective development of the desired image.

Why is alignment important for lithography equipment?General reference — not yet source-verified

Alignment ensures that each new pattern lands in the correct position relative to previously formed structures, which is essential for multilayer device fabrication.

Not publicly documented

The following facts about the ACS 200 Gen 3 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the ACS 200 Gen 3 are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the ACS 200 Gen 3 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the ACS 200 Gen 3 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the ACS 200 Gen 3 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the ACS 200 Gen 3 are on record.
Answerable by: an OEM parts catalog or a service engineer