Comparison ledger
Nikon 1505 G 6 E, SUSS MicroTec ACS 200 Gen 3, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1505 G 6 ENikon | ACS 200 Gen 3SUSS MicroTec |
|---|---|---|
| OEM | Nikon | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | 1988– | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Nikon 1505 | SUSS MicroTec ACS 200 |
| Cited variants | — |
|
| Specifications | ||
| Configuration | 5" reticle[2] | Bake Plate (8):[5] |
| Resolution | 650 nm[3] | — |
| Numerical Aperture | 0.54[3] | — |
| Reduction | 5x[3] | — |
| Exposure Field | 15 x 15 mm[3] | — |
| Alignment Accuracy | 130 nm[3] | — |
| Wafer Size | 4 inch[2] | — |
| Light Source | g-line[4] | — |
| Introduction Year | 1988[3] | — |
| NA (Numerical Aperture) | 0.54[3] | — |
| Make | Nikon[2] | — |
| Model | 1505 G 6 E[2] | — |
| Category | Stepper[2] | — |
| Wafer Sizes | 4 inch[2] | 2, 3, 4, 5, 6, 8, 12 inch[5] |
| Exposure type | g-line[3] | — |
| NA | 0.54[3] | — |
| Exposure field | 9.3 x 18.8 mm[3] | — |
| Set-up Transformer | — | 50 Hz Compatible Model[5] |
| Cassette Stations (4) | — | Compatible with Open Cassettes[5] |
| Wafer Transfer System | — | Dual-Arm (Nidec Sankyo) End Effector[5] |
| Pre-Aligner | — | Equipped with Orientation flat/notch postition rotation for both opague (Si water) & transparent (glass water)substrates[5] |
| Temp | — | 60-250 Deg C[5] |
| Vintage | — | 2019 |
| Coaters & Developers Vintage | — | 2019 |
| - # of develop line each bowl | — | 2:DEV (binary , fan spray), 2: DI (binary, fan spray), 1:N2 |
| Max Wafer Size (product detail) | — | up to 8 inch[5] |
| Cassette Stations | — | 4 (compatible with Open Cassettes)[5] |
| Bake Plates | — | 8, supports proximity bake, temperature 60-250 °C[5] |
| Cool Plates | — | 3, temperature 18-25 °C, proximity supported[5] |
| Configuration (variant) | — | Coater/Developer with 4 developers, 4D setup[1] |
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