Applied Materials
9500 XR Ion
The Applied Materials 9500 XR Ion is an ion implanter designed for 8-inch wafers. The 9500 XR Ion is a high-current implanter that supports dopant gases BF3, AS, and P. The tool is a member of the PI 9500 family.[1][2]
Power
Spin / Scan Power Supply Control Cable[1]
Vacuum
MRS Turbo Pump Controller[1]
Gas delivery
BF3, AS, P[1]
What it is
How it works
General reference — not yet source-verifiedExtracted ions are accelerated through an electric field to achieve the desired kinetic energy.
A mass analyzer filters the ion beam to select a single species and charge state.
Where it fits in the process flow
General reference — not yet source-verifiedIon implantation is a doping step used after photoresist patterning and before thermal annealing in the fabrication of integrated circuits.
The high-current class of implanter is typically employed for source/drain or deep-well implants that require high dose levels.
Applications
General reference — not yet source-verifiedThe 9500 XR Ion is used to implant dopant species into silicon wafers for CMOS transistor fabrication.
Common implant applications include threshold voltage adjustment, source/drain formation, and punch-through stopping.
Why won't it start?
Documented failure modes, common issues, and field considerations.
- Missing parts are listed in the source, including flight tube, dual frequency motor for H/E, HD-PFS assembly, mass spectrometer Hiden, radiator, MRS turbo pump controller, source turbo pump, spin/scan power supply control cable, suppression voltage application cable, source bushing, liner, electrode manipulator, source chamber, beam stop, PDA, VAT 100 valve, valve holder, flight tube retainer, acceleration tubes, scan encoder, beam profiler, and NW 25x150mm Frexi.
What do the numbers mean?
Power & electrical2
Vacuum & pumping2
Wafer handling1
Gas & chemistry2
Configuration & options18
- High Current[1]
- Missing Parts:[1]
- Flight Tube[1]
- Dual Frequency Motor for H/E[1]
- HD-PFS Assembly[1]
- Mass Spectrometer Hiden[1]
- Radiator[1]
- Source Bushing[1]
- Liner[1]
- Electrode Manipulator[1]
- Source Chamber[1]
- Beam Stop[1]
- PDA[1]
- VAT 100 Valve[1]
- Valve Holder[1]
What replaced it?
Alternatives
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
- Axcelis NV 8250— Same function class: Ion Implantation, UnknownCompare in depthsource[3]
- Axcelis NV 8250 HT Ion— Same function class: Ion Implantation, UnknownCompare in depthsource[4]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the 9500 XR Ion are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 9500 XR Ion are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 9500 XR Ion are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 9500 XR Ion are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the 9500 XR Ion is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the 9500 XR Ion are on record.
Answerable by: an OEM parts catalog or a service engineer
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]waferpedia.com — waferpedia.comwaferpedia.com
- [3]Equipment inventory listing
- [4]Equipment inventory listing
Last updated Oct 10, 2026.
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The Axcelis NV 8250 is an ion implanter for 8-inch wafer processing with an energy range of 0-250 keV.
Axcelis NV 8250 HT Ion Implanter is an 8-inch ion implanter with listed power and vacuum-related configuration details.
The Varian 0216 7696, E 11368072 ESC is an electrostatic chuck (ESC) platen of the ADV-S type, categorized under ion implantation equipment.
