Varian
160 XP
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Varian 160 XP is an ion implanter. The Varian 160 XP Ion variant is configured as a 150 mm high-current implanter.[1][2]
What it is
General reference — not yet source-verifiedThe Varian 160 XP is an ion implanter used in semiconductor manufacturing for doping silicon wafers with dopant atoms.
How it works
General reference — not yet source-verifiedThe beam is mass-analyzed to select only the desired isotope, then focused and scanned either by electrostatic or mechanical means. The wafer is held on a platen that may be tilted to control channeling effects.
Applications
General reference — not yet source-verifiedApplications include source/drain implants, polysilicon gate doping, and deep well implants for both bipolar and CMOS technologies. High-current implanters are typically employed for high-dose, low-energy implants.
What do the numbers mean?
Configuration & options1
Vintage & configurations
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| 160 XP Ion | — | — | — | waferpedia.com[2] |
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the 160 XP are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
Fewer than 3 independently cited specifications for the 160 XP are on record; the remainder await public documentation.
Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 160 XP are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the 160 XP are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 160 XP are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 160 XP is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]160 XP — Varian | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
- [2]waferpedia.com — waferpedia.comwaferpedia.com
- [3]Inventory photo
- [4]Equipment inventory listing
Last updated Oct 9, 2026.
Compare with similar tools
View all →The Varian 0216 7696, E 11368072 ESC is an electrostatic chuck (ESC) platen of the ADV-S type, categorized under ion implantation equipment.
The Varian 160 XP Ion is an ion implantation tool configured as a 150mm high-current implanter.
