Category
Ion Implantation
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147 entries
- VIISta HC Ion ImplantApplied Materials
The Applied Materials / Varian VIISta HC Ion Implant is an ion implantation system.
CategoryIon Implantation - 350DVarian
The Varian 350D is a medium current ion implanter that was the tool of choice for semiconductor doping in the early 1980s.
CategoryIon ImplantationDiscontinued - VIISta 810Applied Materials
Applied Materials / Varian VIISta 810 is a 12-inch medium current implanter.
CategoryIon Implantation - 6200 AAxcelis
The Axcelis 6200 A is an ion implanter that accepts 6-inch wafers and supports automatic recipe loading.
CategoryIon Implantation - VIISta 810 XEriApplied Materials
The Applied Materials / Varian VIISta 810 XEri is an ion implanter described as a 12-inch medium current system.
CategoryIon Implantation - E 500 HPApplied Materials
The Applied Materials / Varian E 500 HP is an implanter described as a medium current ion implantation system for 8-inch wafers.
CategoryIon Implantation - 912-7014 Triode Lex Ion VacuumVarianCategoryIon Implantation
- TP 500 Implant Dose MeasurementKLA
The KLA / Therma-wave TP 500 is an implant dose measurement tool used in ion implantation.
CategoryIon Implantation - HEXP VIISta HEApplied Materials
The Applied Materials HEXP VIISta HE is an ion implantation tool for 200mm wafers.
CategoryIon Implantation - EHPI 500Varian
The Varian EHPi 500 is a medium current ion implanter offering an energy range of 5–260 keV (X+) and capable of handling wafer sizes up to 200 mm for features down to 0.18 µm.
CategoryIon Implantation - NV 8250 IonAxcelisCategoryIon Implantation
- E 220 HP IonVarian
The Varian E 220 HP is an ion implanter that handles 6-inch and 8-inch wafers.
CategoryIon Implantation - VIISta HE XPApplied Materials
The VIISta HE XP is a high-current ion implanter for semiconductor wafer processing.
CategoryIon Implantation - E 500 EHPI Ion ImplantVarian
Varian E 500 EHPI Ion Implant System is a 6-inch wafer ion implant system with a Windows 7 control computer and V15.10.12 software.
CategoryIon Implantation - TP 420 Implant Dosing MeasurementKLACategoryIon Implantation
- 350 D IonAgilent
The Agilent 350 D Ion Implanter is a 150mm high current ion implanter.
CategoryIon Implantation - 0216 7696, E 11368072 ESCVarian
The Varian 0216 7696, E 11368072 ESC is an electrostatic chuck (ESC) platen of the ADV-S type, categorized under ion implantation equipment.
CategoryIon Implantation - GSD HE High EnergyAxcelis
The Axcelis GSD HE High Energy is an ion implanter for 200 mm wafers.
CategoryIon Implantation - Exceed 3000 AH Evo Ion ImplantNissin
The Nissin Exceed 3000 AH Evo is an ion implant system manufactured by Nissin.
CategoryIon Implantation - E 500 Medium CurrentVarian
The Varian E 500 Medium Current is an ion implanter for 8-inch wafers, introduced around 1996.
CategoryIon Implantation - NV 10 SD 160 IonAxcelisCategoryIon Implantation
- E 500 EHPVarian
The Varian E 500 EHP is a medium current ion implanter that supports 6-inch wafers, includes a thin wafer handling kit, can be converted to 8-inch, and runs on 208V 3-phase 50/60 Hz power.
CategoryIon Implantation - NV 6200AxcelisCategoryIon Implantation
- Viision 200 IonVarian
The Varian Viision 200 is an ion implanter for 8-inch wafers.
CategoryIon Implantation - VHCPApplied Materials
The Applied Materials VHCP is an ion implantation tool.
CategoryIon Implantation - Viision 200 + High CurrentVarian
The Varian Viision 200+ (also known as Viision 200 Plus and VIISion 200) is a high current ion implanter used for semiconductor wafer processing.
CategoryIon Implantation - GSD 200 EAxcelis
The Axcelis GSD 200 E is an ion implanter.
CategoryIon Implantation - E 1000Varian
The Varian E1000 is an ion implanter manufactured by Varian.
CategoryIon Implantation - Exceed 30NissinCategoryIon Implantation
- NV 8200 PAxcelis
The Axcelis NV 8200 P is an ion implantation tool.
CategoryIon Implantation - Optima MD IonAxcelis
The Axcelis Optima MD is a medium current ion implanter for 300mm wafers, manufactured from 2006.
CategoryIon Implantation - NH 20 SP Medium Current IonNissin
The Nissin NH 20 SP is a medium current ion implanter for 200 mm (8 inch) wafers.
CategoryIon Implantation - xR Leap IonApplied Materials
The Applied Materials xR Leap Ion Implanter processes 8-inch Si wafers with an ultra-low energy range down to 300 eV.
CategoryIon ImplantationWaferSi Wafer - EPX 180 NEEdwards
The Edwards EPX 180 NE is a dry vacuum pump designed for semiconductor applications such as ash/strip and implant end stations.
CategoryIon Implantation - NV 10 160 IonAxcelis
The Axcelis NV 10 160 is an ion implanter that handles wafers from 3 to 6 inches and offers a maximum implant energy of 160 keV.
CategoryIon ImplantationWaferMultiple wafer disks - SEN NV GSD III 180 High Current IonSumitomo
The Sumitomo / SEN NV GSD III 180 is a high current ion implanter stated to be for 6-inch wafers.
CategoryIon Implantation - Viision 80 Medium Current IonVarian
Varian Viision 80 is a medium current ion implanter with an 8-inch wafer size.
CategoryIon Implantation - IMP HEAT Medium CurrentNissinCategoryIon Implantation
- GSD 100 High CurrentAxcelis
The Axcelis GSD 100 High Current is a high current ion implanter that accepts 6-inch wafers.
CategoryIon Implantation - GSD 200 E High CurrentAxcelisCategoryIon Implantation
- PLADApplied Materials
Applied Materials PLAD is an ion implantation tool in the plasma doping family.
CategoryIon Implantation - TP 500 Implant Dosing MeasurementKLACategoryIon Implantation
- EHP 500Applied Materials
The Applied Materials / Varian EHP 500 is an ion implanter for 6-inch wafers.
CategoryIon Implantation - NV GSD High EnergyAxcelis
The Axcelis NV GSD High Energy is an ion implanter for 8-inch wafers.
CategoryIon Implantation - VAC 407 2 ABrooks
The Brooks / PRI VAC 407 2 A is an ion implanter.
CategoryIon Implantation - EHPI E 220Varian
The Varian EHPI E 220 is an ion implanter described as an 8-inch, medium-current system with a SMIF interface.
CategoryIon Implantation - NV GSD III LE High Current IonAxcelis
The Axcelis NV GSD III LE is a high current ion implanter designed for 8-inch wafers, originally manufactured around 2003.
CategoryIon Implantation - NV GSD III 90 IonAxcelis
The Axcelis NV GSD III 90 Ion is an ion implanter for 5-inch wafers, manufactured by Axcelis.
CategoryIon Implantation - PI 9500 XRApplied Materials
The Applied Materials PI 9500 XR is an ion implanter.
CategoryIon Implantation - EHPI 500 Medium CurrentVarian
The Varian EHPI 500 Medium Current is a medium-current ion implanter.
CategoryIon Implantation - NV GSD 200Axcelis
The Axcelis NV GSD 200 is an ion implanter described with 208 V, 3 phase, 50/60 Hz power and 35 kVa input.
CategoryIon Implantation - GSD 200 E 2 High CurrentAxcelis
The Axcelis GSD 200 E 2 is a high current implanter with source-stated wafer sizes of 6 inch and 8 inch.
CategoryIon Implantation - E 500 EHPIAgilent
The Agilent / Varian E 500 EHPI is a medium current ion implanter for 8-inch wafers from 2003.
CategoryIon Implantation - 0010-14300 Magnet AssyApplied MaterialsCategoryIon Implantation
- Viision 200Varian
The Varian Viision 200 (also spelled VIISion 200) is a batch-process, high-current ion implanter for 200 mm wafers, introduced in 1996.
CategoryIon Implantation - NV GSD HEAxcelis
The Axcelis NV GSD HE is an ion implantation system that can handle 6-inch and 8-inch wafers.
CategoryIon ImplantationWafer8" - VIISta 900 XP IonApplied Materials
The Applied Materials VIISta 900 XP Ion is an ion implanter.
CategoryIon Implantation - NV GSD A 80 IonAxcelisCategoryIon Implantation
- E 220Varian
The Varian E 220 is an ion implanter described as a 3-phase, 5-wire, 208-volt system with E-clamp 6" capability and single-blade processing.
CategoryIon Implantation - EHP 500 IonVarianCategoryIon Implantation
