Applied Materials
EHP 500
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Applied Materials / Varian EHP 500 is a medium current ion implanter that processes 6-inch wafers.[1]
What is it?
What do the numbers mean?
Wafer handling1
Configuration & options2
- Medium Current[1]
What replaced it?
Alternatives
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
- Varian Viision 200 Ion— Same function class: Ion Implantation, nullCompare in depthsource[1]
- Varian EHPI E 220— Same function class: Ion Implantation, nullCompare in depthsource[1]
- Varian EHPI 500— Same function class: Ion Implantation, nullCompare in depthsource[1]
- Varian Viision 200— Same function class: Ion Implantation, nullCompare in depthsource[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Not publicly documented
The following facts about the EHP 500 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the EHP 500 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the EHP 500 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the EHP 500 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the EHP 500 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the EHP 500 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (1)Every fact above is drawn from these public sources
- [1]inventory listing
Last updated Sep 1, 2026.
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The Varian EHPi 500 is a medium current ion implanter offering an energy range of 5–260 keV (X+) and capable of handling wafer sizes up to 200 mm for features down to 0.18 µm.
The Varian EHPI E 220 is an ion implanter described as an 8-inch, medium-current system with a SMIF interface.
The Varian Viision 200 (also spelled VIISion 200) is a batch-process, high-current ion implanter for 200 mm wafers, introduced in 1996.
The Varian Viision 200 is an ion implanter for 8-inch wafers.