Varian
E 220
Plate 01Merc E220 LR15
AG CarsWatch on YouTubePlate 02Mercedes Benz E220 Avantgarde
Ollie Kierce CarsWatch on YouTubePlate 03Varian E220 - 150mm Implant - MC3 beam
Veilingkantoor Openbare verkopenWatch on YouTubePlate 042025 Mercedes Benz E220. #mercedes #benz #eclass
4 Cars and WatchesWatch on YouTube
What it is
How it works
General reference — not yet source-verifiedIon implanters generate a beam of charged ions from a source gas, accelerate the ions to a desired energy, filter the beam by mass-to-charge ratio using a mass analyzer, and then scan the beam across a wafer held in an end station.
Where it fits in the process flow
General reference — not yet source-verifiedIon implantation is typically performed in the front-end-of-line (FEOL) portion of wafer fabrication, after epitaxial growth or oxidation and before the annealing step that activates the implanted dopants.
The process step is used to create doped regions such as wells, source/drain extensions, and channel stops in CMOS devices.
Why won't it start?
Documented failure modes, common issues, and field considerations.
- Turbo Ion Source pump needs to be replaced
- Turbo pump right side End Station needs to be replaced
- Cryo pump and sub fab compressor need to be replaced
- Counter balance needs repair
- Fiber optic communication cards need to be replaced
- Power Supply controller (P/N E15001755) needs to be replaced
- DI water filters need to be replaced
- Ion source cooling water quick coupling connections need to be replaced
What do the numbers mean?
Power & electrical5
Vacuum & pumping3
Optics & imaging1
- Fiber optic communication cards[1]
Dimensions & facilities1
- Ion source cooling water quick coupling connections[1]
Configuration & options18
Vintage & configurations
- 1995Vintage[1]
1995 Vintage is stated in the source.
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the E 220 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented variants, configuration options, or revision breakpoints of the E 220 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the E 220 are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the E 220 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the E 220 are on record.
Answerable by: an OEM parts catalog or a service engineer
No publicly hosted manuals, SOPs, or datasheets for the E 220 are on record.
Answerable by: university cleanroom staff or an OEM application specialist
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]Equipment inventory listing
- [2]waferpedia.com — waferpedia.comwaferpedia.com
- [3]Varian E 220 family | Waferpedia — waferpedia.comwaferpedia.com
Last updated Oct 10, 2026.
Compare with similar tools
View all →The Varian 0216 7696, E 11368072 ESC is an electrostatic chuck (ESC) platen of the ADV-S type, categorized under ion implantation equipment.
The Varian 160 XP is an ion implanter. A variant, the Varian 160 XP Ion, is configured as a 150 mm high-current implanter.
The Varian 160 XP Ion is an ion implantation tool configured as a 150mm high-current implanter.