Metrology & Inspection

The Hitachi S 9200 is a scanning electron microscope (SEM) used for critical dimension (CD) measurements and wafer inspection, designed for 8-inch wafer processing.

The FEI Nova 600i (also called Nova NanoLab 600i) is a DualBeam system combining a field emission scanning electron microscope (FESEM) with a gallium focused ion beam (Ga FIB) for nanoscale prototyping, machining, characterization, and analysis of structures below 100 nm.

The Leica DM2700 M is an upright materials microscope with universal white light LED illumination designed for routine inspection tasks in metallography, earth science, forensic investigation, and materials quality control and research.

The ZEISS Axioscope 5 is a smart upright microscope designed for biomedical routine and research, featuring automatic digital documentation with a Snap button and support for multiple contrast techniques.

The Filmetrics R50 – 200 – 4PP is a metrology tool configured by default for metallic layers and sample thicknesses of 525 µm ± 25 µm.

The Olympus MX51 is a universal reflected-light large stage microscope for industrial and semiconductor inspection, supporting brightfield, darkfield, and fluorescence observation.

Thermo Fisher Scientific / FEI Quanta 3 D FEG 600 is a dual-beam FIB-SEM-EDS system described as a focused ion beam, scanning electron microscope, and energy dispersive X-ray spectroscopy instrument.

The KLA 200 series is a pattern inspection station used for reticle and photomask inspection.

The Onto Innovation / Nanometrics HL 5500 is a Hall Effect Measurement System for semiconductor characterization.

The Mitutoyo M Plan NUV 50 Microscope Objective is a microscope objective categorized under Metrology & Inspection.

The KLA AlphaStep D-300 is a stylus-based surface profiler that measures step heights from 50 nm to 300 µm.

KLA PN: 29 0177 Window, Lamp House is a fused silica part stated to be capable of working on KLA UV 1xy0.

The Applied Materials NanoSEM 3 D CD-SEM is a critical dimension scanning electron microscope for 6-inch wafers, manufactured in 2001.

Mitutoyo Crysta Plus M 574 is a manual coordinate measuring machine with Renishaw MH20i/TP20 probing and MCOSMOS M1 software.

The Thermo Fisher Scientific / FEI Sirion is a scanning electron microscope (SEM) used for imaging and analysis at high magnifications.

KLA F 60 is a film thickness measurement tool used in semiconductor metrology and inspection.

The KLA 1.112 PSL Wafer is an 8-inch NIST-traceable reference wafer compatible with Surfscan 6xy0 and Sp1 inspection systems.

The KLA SLF 17 is an inspection system.

The Rigaku Ultima III is a diffractometer configured with a high-speed silicon strip detector, automatic sample exchange, X-ray generator, multiple detector and optics options, and a five-axis high-precision goniometer.

KLA Candela CS 2 Surface is a metrology and inspection tool described as a surface inspection system and surface analyzer.

The Bruker/Veeco 5000 is an atomic force microscope (AFM) manufactured by Bruker (formerly Veeco).

The Koh Young KY 8080 SPI is an in-line, fully automated solder paste inspection system that uses patented shadow-free Moiré camera technology for 3D inspection.

The Hitachi IS 3200 SE is a darkfield inspection system.

The Sonoscan D 9000 C-SAM is an acoustic micro imaging system used for non-destructive inspection.

The KLA Archer 300 is an overlay metrology system for optical overlay measurements on 300mm wafers.

The Bruker InSight 3 DAFM Photomask Atomic Force Microscope is a photomask atomic force microscope designed for 12-inch wafers.

The KLA 8100 XP is a critical dimension scanning electron microscope (CD-SEM) designed for automated CD measurements on silicon wafers and reticles, featuring production-proven electron optics for bottom imaging of high aspect ratio structures.

The Thermo Fisher Scientific FEI XL 30 E-SEM is an environmental scanning electron microscope (E-SEM) classified under metrology and inspection equipment.

The Ultratech CGS 300 Stress Measurement is a semiconductor wafer stress measurement system associated with 12-inch wafers.

The Thermo Fisher Scientific Nicolet 6700 FT-IR spectrometer is a Fourier transform infrared spectrometer that can be configured with the Continuum microscope.

The KLA Alpha Step D 500 Wafer Profiler Meter is a stylus profiler for 2D step height measurement, roughness, bow, and stress metrology.

The Leica S9 is a Greenough-type stereomicroscope with a 9:1 zoom and magnification range of 6.1x-55x.

The Parmi HS 60 SPI is a solder paste inspection system for metrology and inspection applications.

The LEO 1450 VPSE is a variable-pressure scanning electron microscope (SEM) platform with mounted EDS microanalysis, a BSE detector system, active isolation, and dedicated control terminals.

The Onto Innovation NSX 105 Macro Defect is a macro defect inspection system for 300 mm wafers.

The Bruker / Veeco Dektak XT is a profilometer with a 4-inch stage, software-controlled movement, a 12.5-micron stylus diameter, and an included enclosure.

The Orbotech Ultra Fusion Series is an inspection system with a minimum line/space of 5/5 μm and a minimum defect size of 1.2 μm.

The Koh Young KY 8030 M SPI is a solder paste inspection system used in electronics manufacturing.

The KLA Tencor D600 is a stylus surface profiler for thin and thick film step height measurement.

The Toho Technology FLX-2320-S measures changes in wafer or substrate radius of curvature caused by deposition of a stressed thin film.

Zeiss MERLIN is a scanning electron microscope at CMi reserved for imaging and process-control inspection, with support for imaging, EDX analysis, and offline analysis in ProSEM.

The Malvern Panalytical Empyrean is a multi-purpose X-ray diffractometer.

The Sonix SAM Autowafer is a scanning acoustic microscope for bond inspection.

The Morgagni 268 is a Transmission Electron Microscope (TEM) manufactured by Thermo Fisher Scientific / FEI.

The KLA P 16 Surface is a surface profilometer described as a fully refurbished unit with Windows XP, extended range up to 1 mm, and a 3D option.

The Bruker Dimension 340 is an atomic force microscope (AFM) originally introduced as a Veeco system.

The JDSU OIM-400 is a fiber optical microscope with 400x magnification, designed for inspecting fiber optic connectors.

The KLA Surfscan SP 1 TBI Keyboard is a keyboard-only replacement part for the KLA Surfscan SP 1 TBI system.

The Hitachi S 4800 is a field emission scanning electron microscope with a cold field-emission source and 12-inch wafer capability.

The KLA Surfscan SP 1 Classic Particle Defect System is a particle defect inspection system for 6-inch and 8-inch wafers.

Onto Innovation 4Di is a product family listed under the company’s Metrology category.

The Nikon 276100 is a microscope with stage.

The Applied Materials G 3 Lite is a scanning electron microscope (SEM) for review applications.

KLA P 16 + Profiler is a metrology and inspection tool with listed wafer sizes from 2 inch to 12 inch.

The KLA Surfscan 7700 is a particle defect inspection system.