KLA
8100 XP CD-SEM
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The KLA 8100 XP CD-SEM is a Critical Dimension Scanning Electron Microscope. The KLA 8100 XP CD-SEM performs fully automated cassette-to-cassette CD measurements on silicon wafers and reticles. The KLA 8100 XP CD-SEM has electron optics for bottom imaging of high aspect ratio structures.[1][2]
Where it fits in the process flow
What do the numbers mean?
Power & electrical5
Wafer handling3
Performance2
Control & software1
Dimensions & facilities1
Configuration & options6
Vintage & configurations
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| 8100XP-R | — | — | Optimized for reticle-specific applications; includes Advanced Charge Elimination (ACE) for stable imaging on chrome-on-glass and phase shift masks; enhanced resolution extends linear measurement range to below 0.15 µm | web.archive.org[1] |
| 8100-T | — | — | Fastest fully automated e-beam metrology system for CD and thin film head imaging; combines secondary and backscatter electron imaging for precise pattern recognition and focusing at zero throat; reticle measurements possible | web.archive.org[1] |
| 8300 | — | — | Extension of 8100 CD SEM product line for 300 mm wafers; field-proven electron optics from 8100XP; modular RITe loader; dual FOUP (13 or 25 wafer) or dual cassette configurations; accommodates 200 mm wafers; advanced networking and automation; highest throughput in class | web.archive.org[1] |
| 8100XP-R CD SEM | — | — | Optimized for reticle-specific applications. | web.archive.org[1] |
| 8100-T CD SEM | — | — | Used for critical dimension measurement and thin film head imaging; reticle measurements are also possible. | web.archive.org[1] |
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What does the KLA 8100 XP measure?
The KLA 8100 XP performs automated critical dimension measurements on silicon wafers and reticles.[1]
What process-control role does the KLA 8100 XP serve?
The KLA 8100 XP provides quick feedback for lithography and etch process control.[2]
Not publicly documented
The following facts about the 8100 XP CD-SEM are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 8100 XP CD-SEM are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the 8100 XP CD-SEM are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 8100 XP CD-SEM are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 8100 XP CD-SEM is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the 8100 XP CD-SEM are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]web.archive.org — tencor.com (Oct 9, 1999)web.archive.org
- [2]web.archive.org — kla-tencor.com (Jan 24, 2010)web.archive.org
- [3]Inventory photo
- [4]inventory listing
Last updated Oct 4, 2026.
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