Applied Materials
xR 200 S
Applied Materials xR 200 S is an ion implantation tool. Applied Materials xR 200 S is configured for 8 inch wafers. Applied Materials xR 200 S is fully automated.[1][2]
What it is
How it works
The xR 200 S generates an ion beam from a source that uses process gases. The beam is shaped and accelerated before being directed to the wafer. The tool includes a flight tube and a cryogenic pump to maintain vacuum conditions. A mass revolving system (MRS) is used for selecting the desired ion species.[1][2]
Where it fits in the process flow
General reference — not yet source-verifiedIon implantation is a critical step in semiconductor device fabrication, typically performed after the formation of gate structures and before the activation anneal. The xR 200 S implants dopant ions into defined regions of the wafer to alter electrical conductivity, enabling the creation of source/drain junctions, well regions, and threshold-voltage adjustments.
What do the numbers mean?
Power & electrical6
- 50/60 Hz[1]
Vacuum & pumping4
Wafer handling3
Gas & chemistry5
Configuration & options14
- Fully Automated[1]
- Includes Spare Parts:[1]
- 3 spare sources[1]
- 2 bushings[1]
- 3 MRS (Mass Revolving System)[1]
- 2 source housing[1]
- Flight tube[1]
- Many parts for the source maintenance & tool maintenance[1]
- Includes Spare Parts
- 3 spare sources; 2 bushings; 3 MRS (Mass Revolving System); 2 source housing; Flight tube; Many parts for source maintenance and tool maintenance[1]
Vintage & configurations
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Phase3 Phase[1]
- Configuration50/60 Hz[1]
- ConfigurationGas cylinders removed[1]
- ConfigurationGas lines and beamline have been purged with N2[1]
- ConfigurationCryo pump[1]
- Power3 Phase[2]
- Frequency50/60 Hz[1]
- VacuumCryo pump[2]
- Gas deliveryGas cylinders removed[2]
- Gas lines and beamlinePurged with N2[1]
- Power Phase3 Phase[1]
- Power Frequency50/60 Hz[1]
- Vacuum PumpCryo pump[1]
- Gas DeliveryGas cylinders removed; gas lines and beamline purged with N2[1]
- Includes Spare Parts3 spare sources, 2 bushings, 3 MRS (Mass Revolving System), 2 source housing, flight tube, cryo pump, many parts for source & tool maintenance[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the xR 200 S are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the xR 200 S are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the xR 200 S are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the xR 200 S are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the xR 200 S is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the xR 200 S are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]waferpedia.com — waferpedia.comwaferpedia.com
- [3]waferpedia.com — waferpedia.comwaferpedia.com
Last updated Oct 10, 2026.
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