Waferpedia

SPTS

MACS ICP

EtchSPTS MACS ICP family
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The SPTS MACS ICP is an 8-inch etcher. The SPTS MACS ICP has an HR chamber. The SPTS MACS ICP uses a cassette-to-cassette MACS loader.[1][2]

MACS ICP — Inventory photo
Fig. 01MACS ICPInventory photo[3]

Power

RF Generators:[3]

Vacuum

Carousel vacuum load lock[3]

Gas delivery

Gases:[3]

What it is

The SPTS / STS MACS ICP is an 8-inch etcher with an HR chamber and a cassette-to-cassette MACS loader.[1][2]

How it works

The MACS ICP uses a carousel vacuum load lock and a MACS loader for cassette-to-cassette operation.[3][1][5]

The MACS ICP uses helium backside cooling and a standard WTC clamp type.[3][1][5]

Where it fits in the process flow

General reference — not yet source-verified

The MACS ICP sits in the dry-etch segment of semiconductor manufacturing.

Applications

The MACS ICP is configured for advanced silicon etch with a Bosch process.[5]

What do the numbers mean?

Power & electrical4

RF Generators:[3]
Accurate?
Coil RF power
Advanced Energy RFG3001, 3kw[3]
Accurate?
Platen RF power
ENI ACG-3B 13.56MHZ, 300w[3]
Accurate?
Voltage
208 Volts / 60 Hz, 40 Amps/phase[4]3 sources
Accurate?

Vacuum & pumping7

Carousel vacuum load lock[3]
Accurate?
Vacuum System:[3]
Accurate?
Load lock pump
Ebara AAL10[3]
Accurate?
Chamber pump
Ebara A30W[3]
Accurate?
Turbo pump
Leybold MAG2000CT[3]
Accurate?
Turbo Pump Controller
Leybold MAG Drive 2000[3]
Accurate?
Vacuum load lock
Carousel vacuum load lock[3]
Accurate?

Wafer handling5

MACS loader for cassette to cassette operation (2 load stations)[3]
Accurate?
Wafer size
8 inch[3]
Accurate?
Wafer capability
6", 8" capable[3]
Accurate?
Wafer handling
MACS loader for cassette to cassette operation (2 load stations)[3]
Accurate?
Wafer size
150/200mm[4]2 sources
Accurate?

Gas & chemistry6

Gases:[3]
Accurate?
C4F8 (200 sccm)[3]
Accurate?
SF6 (1000 sccm)[3]
Accurate?
O2 (200 sccm)[3]
Accurate?
Ar (50 sccm)[3]
Accurate?
Gases
C4F8 (200 sccm); SF6 (1000 sccm); O2 (200 sccm); Ar (50 sccm)[3]
Accurate?

Configuration & options13

HR chamber[3]
Accurate?
6", 8" capable[3]
Accurate?
Helium backside cooling (HBC)[3]
Accurate?
Clamp type
standard WTC[3]
Accurate?
Chiller
ATS/DEX-20ADI[3]
Accurate?
Manufacturer
SPTS / STS[3]
Accurate?
Model
MACS ICP[3]
Accurate?
Category
Etch[1]
Accurate?
Chamber
HR chamber[3]
Accurate?
Backside cooling
Helium backside cooling (HBC)[3]
Accurate?
Vintage
2002[3]
Accurate?
Vintage
2001[4]2 sources
Accurate?
Chamber quantity
1 chamber[5]
Accurate?

Vintage & configurations

Documented models & variants

DesignationGenerationVintageChangesSource
MACS ICP HR—2001HR etch system variant; sources describe it as an HR dry etch system.hommer.com.tw[4]
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • ConfigurationCarousel vacuum load lock[3]
  • ConfigurationRF Generators:[3]
  • Coil RF powerAdvanced Energy RFG3001, 3kw[3]
  • Platen RF powerENI ACG-3B 13.56MHZ, 300w[3]
  • ConfigurationGases:[3]
  • ConfigurationC4F8 (200 sccm)[3]
  • ConfigurationSF6 (1000 sccm)[3]
  • ConfigurationO2 (200 sccm)[3]
  • ConfigurationAr (50 sccm)[3]
  • ConfigurationVacuum System:[3]
  • Load lock pumpEbara AAL10[3]
  • Chamber pumpEbara A30W[3]
  • Turbo pumpLeybold MAG2000CT[3]
  • Turbo Pump ControllerLeybold MAG Drive 2000[3]
  • Vacuum load lockCarousel vacuum load lock[3]
  • GasesC4F8 (200 sccm); SF6 (1000 sccm); O2 (200 sccm); Ar (50 sccm)[3]
  • Voltage208 Volts / 60 Hz, 40 Amps/phase[4]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What wafer size does the SPTS MACS ICP handle?

The SPTS MACS ICP is an 8-inch etcher.[3][1][2]

Does the SPTS MACS ICP have an HR chamber?

The SPTS MACS ICP has an HR chamber.[3][1][2][5]

What wafer handling method does the SPTS MACS ICP use?

The SPTS MACS ICP uses a cassette-to-cassette MACS loader.[3][1][2][5]

What cooling method does the SPTS MACS ICP use?

The SPTS MACS ICP uses helium backside cooling.[3][1][5]

Not publicly documented

The following facts about the MACS ICP are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the MACS ICP are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • The control-system platform and OS era of the MACS ICP are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the MACS ICP are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the MACS ICP is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the MACS ICP are on record.

    Answerable by: an OEM parts catalog or a service engineer

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Sources & citations

Sources (5)Every fact above is drawn from these public sources
  1. [1]waferpedia.com — waferpedia.comwaferpedia.com
  2. [2]SPTS MACS ICP family | Waferpedia — waferpedia.comwaferpedia.com
  3. [3]Inventory photo
  4. [4]hommer.com.tw — hommer.com.twhommer.com.tw
  5. [5]challentech.com.tw — challentech.com.twchallentech.com.tw
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Last updated Oct 9, 2026.

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