Nikon
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The Nikon NSR S 208 D is a KrF scanning system operating at 248 nm. The Nikon NSR S 208 D is targeted for volume production of 110 nm devices and sub-critical 90 nm layers. The Nikon NSR S 208 D features an NA of 0.82, a 4x reduction, and accommodates 200 mm and 300 mm wafers.[1]

A mask aligner or scanner in this class transfers circuit patterns from a photomask onto a photoresist-coated wafer using projection optics and controlled exposure.
A scanner in this class steps the exposure field across the wafer rather than exposing the full wafer at once.
The Nikon NSR S 208 D is positioned for volume production of integrated circuit layers at the lithography step.[1]
The NSR-S208D was introduced in 2004.
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The Nikon NSR S 208 D is a KrF scanning system.[1]
The following facts about the NSR S 208 D KrF are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented variants, configuration options, or revision breakpoints of the NSR S 208 D KrF are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the NSR S 208 D KrF are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the NSR S 208 D KrF are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the NSR S 208 D KrF is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the NSR S 208 D KrF are on record.
Answerable by: an OEM parts catalog or a service engineer
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Last updated Oct 3, 2026.
Brooks 017-0146-01 is a prealigner manufactured by Brooks.
The EVG 101 is an advanced resist processing system for spin or spray coating and developing of wafers up to 300 mm.