Comparison ledger
Nikon NSR S 208 D KrF, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | NSR S 208 D KrFNikon | 150 e MaskSUSS MicroTec |
|---|---|---|
| OEM | Nikon | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | 2004 Introduction | — |
| Control system | — | — |
| Generation | — | — |
| Family | Nikon NSR S 208 | SUSS MicroTec 150 e Mask |
| Specifications | ||
| Configuration | 110nm[1] | — |
| Resolution | 110 nm[2] | — |
| Numerical aperture (NA) | 0.82[2] | — |
| Wafer size | 200/300 mm[2] | — |
| Reduction factor | 4x[2] | — |
| Exposure field | 26 x 33 mm[2] | — |
| Alignment accuracy | < 10 nm[2] | — |
| Model | NSR S 208 D[3] | — |
| Type | KrF scanner[3] | — |
| Exposure wavelength | 248/KrF[2] | — |
| Reduction | 4x[2] | — |
| Numerical aperture | 0.82[2] | — |
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