Nikon
NSR S 203 B
The Nikon NSR S 203 B is a 248 nm lithography system used for photolithography on 200 mm wafers.[1][2][3][4][5]
What it is
How it works
General reference — not yet source-verifiedA lithography stepper projects a patterned mask image onto photoresist-coated wafers to define circuit features.
A lithography scanner typically exposes the wafer field in a controlled scanning motion to improve image fidelity and throughput in projection lithography.
Where it fits in the process flow
General reference — not yet source-verifiedThe Nikon NSR S 203 B sits in the front-end lithography module of semiconductor manufacturing, after wafer preparation and photoresist coating and before pattern transfer into underlying layers.
The Nikon NSR S 203 B supports pattern definition for downstream etch, implantation, or deposition integration steps that follow lithographic exposure and development.
Why won't it start?
Documented failure modes, common issues, and field considerations.
- HDD removed
- Missing parts: (2) HDD, pumps, chillers, abatement
- Excluded: hard drives (2)
- Pumps, chillers, and abatement are excluded
What do the numbers mean?
Vacuum & pumping1
- (2) HDD, Pumps, Chillers, Abatement[3]
Wafer handling6
- (1) Open cassette[3]
Optics & imaging5
- 248 nm[2]
Performance2
Control & software2
Configuration & options27
What replaced it?
Alternatives
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
- KLA ICOS CI 8 X 50 Lead— Same function class: Lithography, UnknownCompare in depthsource[7]
- ASML Twinscan XT 1400 F— Same function class: Lithography, nullCompare in depthsource[8]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Configuration(2) HDD, Pumps, Chillers, Abatement[3]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What fab function does the Nikon NSR S 203 B serve?
The Nikon NSR S 203 B serves photolithography patterning in semiconductor manufacturing.[4]
Not publicly documented
The following facts about the NSR S 203 B are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the NSR S 203 B are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the NSR S 203 B are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the NSR S 203 B are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the NSR S 203 B is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the NSR S 203 B are on record.
Answerable by: an OEM parts catalog or a service engineer
Sources & citations
Sources (9)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]Inventory photo
- [3]inventory listing
- [4]Inventory photo
- [5]inventory listing
- [6]Inventory photo
- [7]Equipment inventory listing
- [8]Equipment inventory listing
- [9]Nikon Precision Inc — nikonprecision.com (May 15, 2006)web.archive.org
Last updated Oct 8, 2026.
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KLA ICOS CI 8 X 50 Lead is a lead scanner described with 3.4 kW power and related operating requirements.
The ASML Twinscan XT 1400 F Scanner is a 193nm (ArF) lithography scanner stated to handle 12-inch wafers.