KLA
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KLA RS 100 is a high-speed four-point probe resistivity tester. The KLA RS 100 measures sheet resistance on wafers from 2 to 12 inches. The KLA RS 100 uses an integrated heater/temperature-sensor and ceramic probe conditioning plate for stable measurements.[1]

The KLA RS 100 is a four-point probe (4PP) system designed for sheet resistance and resistivity measurements of conductive films on semiconductor wafers. The RS 100 accommodates wafer sizes of 200 mm (8 inch) and 300 mm (12 inch). The system includes an integrated heater and temperature sensor, a ceramic probe conditioning plate, and an optical wafer aligner with a CCD camera and ring illuminator. The RS 100 uses a Pentium III computer running Windows NT with software version 2.31.[2][1]
The RS 100 is applicable to a wide range of materials, including polysilicon, copper, and bulk silicon substrates. The system supports routine checks with 1 to 30 programmable test sites and XY mapping or user-defined patterns with up to 1,200 sites. The edge exclusion for measurements is 1 mm from the edge of the conductive film. Applications span metal deposition, CMP, ion implantation, and diffusion process monitoring.[1]
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The RS 100 accommodates 200 mm (8 inch) and 300 mm (12 inch) wafers, and also supports manual loading for all wafer diameters from 2 inch to 12 inch.[2][1]
The measurement range is greater than 5 mΩ/sq to less than 5 MΩ/sq. Absolute accuracy, based on NIST-traceable standards corrected to 23°C, is ±1% of the certified value.[1]
Measurement repeatability per the KLA-Tencor Probe Qualification Test at a 1 mm test diameter is less than 0.2% (1σ). Reproducibility for representative metals (e.g., Cu, W, TiN) is less than 0.5%.[1]
The RS 100 is controlled by a Pentium III computer with keyboard and trackball, running Windows NT. The software version is 2.31.[1]
Typical applications include measuring sheet resistance after metal deposition, CMP, ion implantation, and diffusion. The system can measure materials such as polysilicon, copper, and bulk silicon substrates.[1]
The following facts about the RS 100 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the RS 100 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the RS 100 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the RS 100 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the RS 100 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the RS 100 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Sep 28, 2026.