Denton Vacuum
Discovery Cathode
The Denton Vacuum Discovery Cathode is a deposition system configured as a sputtering tool. The Denton Vacuum Discovery Cathode is a 12.0-inch sputtering system with planetary load lock and robot loading assemblies. The Denton Vacuum Discovery Cathode includes four 12-inch cathodes.[1][2]
Plate 01Denton Vacuum System: Changing a Cathode in a Discovery Sputtering System
Denton VacuumWatch on YouTube
What it is
The Denton Vacuum Discovery Cathode is a deposition system configured as a sputtering tool designed for semiconductor and thin-film manufacturing. The system is a 12.0-inch sputtering system that incorporates a planetary load lock and robot loading assemblies.[2][1]
How it works
The Discovery Cathode operates as a physical vapor deposition (PVD) tool using magnetron sputtering as its primary deposition method. The system includes a stainless steel chamber approximately 4 feet by 6 feet by 12 inches that houses the deposition process.[2][1]
The tool is equipped with four 12-inch cathodes that serve as target material holders for sputtering. Four Advance Energy Pinnacle plus DC power supplies provide the electrical energy needed to create a plasma for the sputtering process.[2][1]
Vacuum in the system is maintained by a CTI Cryogenics high vacuum pump with blanket heater, a Torr400 cryopump with Oxford E500 dual temperature monitor, and a KYKY F400 turbo molecular pump with FV-LII pump controller. The vacuum is further managed by a Vat gate valve and a Vat adaptive pressure controller, along with assorted pressure monitors and isolation valves. A CTI-Cryogenics 9600 compressor supports the cryogenic pumping system.[2][1]
Applications
The Discovery Cathode is used for sputter deposition of thin films of metals, dielectrics, and other materials in research, development, and small-scale production environments. The system includes a Veeco 5 cm gridded ion source with gas controls that can be used for ion beam milling or ion-assisted deposition.[2][1]
What do the numbers mean?
Power & electrical5
Vacuum & pumping16
- CTI Cryogenics High Vacuum Pump/Blanket Heater[2]
- Torr400 Cryopump with Oxford E500 Dual Temperature Monitor[2]
- KYKY F400 Turbo Molecular Pump[2]
- With FV-LII Pump Controller[2]
- Vat Adaptive Pressure Controller[2]
- Assorted Pressure Monitors[2]
- CTI-Cryogenics 9600 Compressor[2]
- Vacuum pumps
- CTI Cryogenics high vacuum pump/blanket heater; Torr400 cryopump with Oxford E500 dual temperature monitor; KYKY F400 turbo molecular pump with FV-LII pump controller[2]
Wafer handling7
Gas & chemistry2
- Veeco 5 cm Gridded Ion Source with Gas Controls[2]
Control & software4
Dimensions & facilities1
Configuration & options15
What replaced it?
Alternatives
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
- Leybold MAG W 2800 CT Turbo— Same function class: Deposition, UnknownCompare in depthsource[3]
- Perkin Elmer 4400— Same function class: Deposition, nullCompare in depthsource[2]
- Perkin Elmer PE 4400— Same function class: Deposition, nullCompare in depthsource[4]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- ConfigurationVeeco 5 cm Gridded Ion Source with Gas Controls[2]
- ConfigurationCTI Cryogenics High Vacuum Pump/Blanket Heater[2]
- ConfigurationTorr400 Cryopump with Oxford E500 Dual Temperature Monitor[2]
- ConfigurationKYKY F400 Turbo Molecular Pump[2]
- ConfigurationWith FV-LII Pump Controller[2]
- ConfigurationVat Adaptive Pressure Controller[2]
- Configuration(4) Advance Energy Pinnacle plus DC Power Supplies[2]
- ConfigurationAssorted Pressure Monitors[2]
- ConfigurationCTI-Cryogenics 9600 Compressor[2]
- ConfigurationStand Alone Power Supply/Control[2]
- Ion sourceVeeco 5 cm Gridded Ion Source with Gas Controls[1]
- High vacuum pumpCTI Cryogenics High Vacuum Pump/Blanket Heater[2]
- CryopumpTorr400 Cryopump with Oxford E500 Dual Temperature Monitor[2]
- Turbo molecular pumpKYKY F400 Turbo Molecular Pump with FV-LII Pump Controller[2]
- CompressorCTI-Cryogenics 9600 Compressor[2]
- DC power supplies(4) Advance Energy Pinnacle plus DC Power Supplies[1]
- Adaptive pressure controllerVat Adaptive Pressure Controller[2]
- Pressure monitorsAssorted Pressure Monitors[2]
- Power supply/controlStand Alone Power Supply/Control[2]
- ManufacturerDenton Vacuum[2]
- Vacuum pumpsCTI Cryogenics high vacuum pump/blanket heater; Torr400 cryopump with Oxford E500 dual temperature monitor; KYKY F400 turbo molecular pump with FV-LII pump controller[2]
- Pressure controlVat gate valve and Vat adaptive pressure controller[2]
- Control systemIon Tech Mps-3000 fc controller; stand alone power supply/control; computer system with related hardware/software[2]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What types of target materials can be used with this cathode?General reference — not yet source-verified
The cathode can accommodate a wide range of solid target materials, including metals, alloys, ceramics, and certain cermets. The choice of target depends on the desired film composition and the driving power (DC for conductors, RF for insulators).
How does the magnetic field configuration affect deposition?General reference — not yet source-verified
The magnetic field shape and strength determine the plasma confinement and target erosion profile. Static magnet arrays provide a simple, uniform field, while rotating or moving magnets can improve target utilization and film uniformity over extended use.
What kind of power supply is required?General reference — not yet source-verified
A direct current (DC) power supply is common for conductive targets, while radio frequency (RF) power is needed for sputtering insulating materials. Pulsed DC supplies are sometimes used to mitigate arcing in reactive sputtering processes.
What maintenance is typically needed?General reference — not yet source-verified
Routine maintenance includes periodic replacement of the target when it erodes, cleaning of the cathode shield and support structures to remove re-deposited material, and inspection of magnets and electrical connections for wear or contamination.
Can this cathode be integrated into an existing vacuum system?General reference — not yet source-verified
Yes, such cathodes are often designed as modular components that can be flange-mounted or fitted into standard vacuum ports, provided the chamber geometry and pumping capacity are compatible with the sputtering pressure range.
Not publicly documented
The following facts about the Discovery Cathode are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Discovery Cathode are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Discovery Cathode are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Discovery Cathode are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Discovery Cathode are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Discovery Cathode is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]waferpedia.com — waferpedia.comwaferpedia.com
- [2]Inventory photo
- [3]Equipment inventory listing
- [4]allwin21.comallwin21.com
Last updated Oct 10, 2026.
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