Axcelis
Purion H 200 High Current
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Axcelis Purion H 200 is a single-wafer high current ion implanter. The Purion H 200 combines a high-current beamline with post-corrector acceleration and deceleration to extend the usable energy range from sub 10 keV to over 400 keV. The Purion H 200 delivers high beam currents for commonly used dopants (B, P, As) with a maximum single charge energy range up to 230 keV.[1][2]
What it is
How it works
The Purion H 200 combines a high-current beamline with post-corrector acceleration and deceleration to extend the usable energy range.[1]
The Purion H 200 uses an indirectly heated cathode source, an analyzer magnet, magnetic quadrupole lenses, a magnetic scanner, and an S-bend corrector magnet in the beamline.[1]
The Purion H 200 uses an Angular Energy Filter and wafer handling system to deliver a monoenergetic beam to the substrate.[1]
Where it fits in the process flow
The Purion H 200 is positioned for high-volume manufacturing of silicon and silicon carbide devices.[1]
Applications
Why won't it start?
Documented failure modes, common issues, and field considerations.
- Photoresist temperature management is addressed because implantation can cause resist reflow and blister defects.
- Photoresist outgassing can create dosimetry challenges during implant.
- The source describes beam current reduction below 40 keV and wafer cooling limits on maximum usable beam currents.
What do the numbers mean?
Power & electrical1
Wafer handling3
Configuration & options5
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Maximum accel voltage170 kV[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the Purion H 200 High Current are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Purion H 200 High Current are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Purion H 200 High Current are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Purion H 200 High Current are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the Purion H 200 High Current is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the Purion H 200 High Current are on record.
Answerable by: an OEM parts catalog or a service engineer
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]axcelis.com — axcelis.comaxcelis.com
- [2]Purion H 200 High Current — Axcelis | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
- [3]Equipment inventory listing
- [4]Equipment inventory listing
Last updated Oct 7, 2026.
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