Applied Materials
Centura Ultima TE HDP
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Applied Materials Centura Ultima TE HDP is a high-density plasma chemical vapor deposition (HDP CVD) system. The Applied Materials Centura Ultima TE HDP supports 8-inch wafers. The Applied Materials Centura Ultima TE HDP is configured with one Ultima TE chamber, two DxZ nitride chambers, one wafer orienter chamber, and one multi-slot cooldown chamber.[1]
Wafer size
(1) Wafer Orienter Chamber
Power
208 Vac[1]
Gas delivery
HDP CVD (Chemical Vapor Deposition)[1]
What it is
The Applied Materials Centura Ultima TE HDP CVD is configured for 200 mm (8 inch) wafers.[1]
Where it fits in the process flow
General reference — not yet source-verifiedHDP CVD is typically used for interlayer dielectric (ILD) deposition and for shallow trench isolation (STI) fill. The low deposition temperature and excellent gap-fill make it suitable for sub-micron node applications. The Centura platform allows clustering with other chambers for pre-clean or post-deposition steps.
Applications
General reference — not yet source-verifiedThe primary application of the Ultima TE HDP system is the deposition of silicon dioxide films for dielectric isolation. The system can also be configured to deposit other dielectrics such as silicon nitride by using appropriate precursors and chamber configurations.
What do the numbers mean?
Power & electrical4
Wafer handling3
- Chamber configuration
- 1 Ultima TE Chamber, 2 DxZ Nitride Chambers, 1 Wafer Orienter Chamber, 1 Multi-Slot Cooldown Chamber[1]
Gas & chemistry1
Configuration & options3
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Not publicly documented
The following facts about the Centura Ultima TE HDP are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Centura Ultima TE HDP are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Centura Ultima TE HDP are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Centura Ultima TE HDP are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Centura Ultima TE HDP are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Centura Ultima TE HDP is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (1)Every fact above is drawn from these public sources
- [1]Inventory photo
Last updated Sep 25, 2026.
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