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Raith eLINE Plus is a multi-technique electron beam lithography and nanoengineering system with an open, upgradable platform and integrated nanomanipulation and focused electron beam induced process capabilities.
The RAITH EBPG5150 is an electron beam lithography system described as a benchmark system for high-throughput, automated, high-precision nanolithography.
Raith EBPG5200 is a direct write electron beam lithography system with high-kV capability and automation features stated in the product page for the EBPG line.