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Lam Research Concept One 150

Lam ResearchDeposition2 entries
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  1. Concept One 150

    The Lam / Novellus Concept One 150 is a plasma-enhanced chemical vapor deposition (PECVD) system for 6-inch wafers.

  2. Concept One 150 PECVD-TEOS

    Lam / Novellus Concept One 150 PECVD-TEOS is a plasma-enhanced chemical vapor deposition system for TEOS deposition on 6-inch wafers.

All entries

  1. Concept One 150Lam Research

    The Lam / Novellus Concept One 150 is a plasma-enhanced chemical vapor deposition (PECVD) system for 6-inch wafers.

    CategoryDeposition
    30 specs
  2. Concept One 150 PECVD-TEOSLam Research

    Lam / Novellus Concept One 150 PECVD-TEOS is a plasma-enhanced chemical vapor deposition system for TEOS deposition on 6-inch wafers.

    CategoryDeposition
    8 specs