Waferpedia

Tool family

Applied Materials Centura 5200

Models in this family

  1. The Applied Materials Centura 5200 is a semiconductor chemical vapor deposition (CVD) system, also offered in a plasma-enhanced (PECVD) configuration, supporting 8-inch wafers.

    Cited variants

    DesignationGenerationVintageChangesSource
    Centura 5200 PECVD——PECVD configuration; source states 8-inch wafers and lists associated chamber and subsystem details.Equipment inventory listing[1]
    Centura 5200 CVD——CVD configuration.Equipment inventory listing[2]
  2. Centura 5200 DPSproduced 1995–

    Applied Materials Centura 5200 DPS is a decoupled plasma source system described as a 4-chamber tool for 8-inch wafers.

  3. The Applied Materials Centura 5200 Dry is a dry etcher used in semiconductor processing, with models supporting 8-inch (200 mm) wafers.

  4. Applied Materials Centura 5200 EPI Reactor is an epitaxial reactor configured with three atmospheric epi chambers and one cool-down chamber.

  5. The Applied Materials Centura 5200 ES MxP Poly is an etch system that handles 8-inch wafers.

  6. Applied Materials Centura 5200 HTF EPI is an epitaxial silicon deposition system for 8-inch wafers.

    Cited variants

    DesignationGenerationVintageChangesSource
    Applied Materials Centura 5200 HTF EPI———Equipment inventory listing[3]
  7. Applied Materials Centura 5200 HTF RP EPI is a reduced-pressure epitaxial silicon deposition system.

  8. The Applied Materials Centura 5200 Mainframe is a semiconductor wafer processing platform used in fabrication facilities.

  9. Applied Materials Centura 5200 Metal is a CVD deposition system stated to support 8-inch wafers.

  10. The Applied Materials Centura 5200 MXP+ is a 200 mm etch system configured with Poly, Dielectric, or chamber-based MxP variants in the provided sources.

    Cited variants

    DesignationGenerationVintageChangesSource
    Centura 5200 MxP Chamber——Described as an MxP Etching Chamber with 200 mm version.fabsurplus.com[4]
  11. The Applied Materials Centura 5200 WXZ Metal is a chemical vapor deposition (CVD) system for 8-inch wafers.

    Cited variants

    DesignationGenerationVintageChangesSource
    Centura 5200 WXZ Metal CVD———Equipment inventory listing[5]
    Centura 5200 WXZ Metal CVD Sprint W——Sprint W configurationEquipment inventory listing[5]

All entries

  1. Centura 5200Applied Materials

    The Applied Materials Centura 5200 is a semiconductor chemical vapor deposition (CVD) system, also offered in a plasma-enhanced (PECVD) configuration, supporting 8-inch wafers.

    CategoryDeposition
    20 specs
  2. Centura 5200 DielectricApplied Materials
    CategoryEtch
    1 spec
  3. Centura 5200 DPSApplied Materials

    Applied Materials Centura 5200 DPS is a decoupled plasma source system described as a 4-chamber tool for 8-inch wafers.

    CategoryEtch
    8 specs
  4. Centura 5200 DryApplied Materials

    The Applied Materials Centura 5200 Dry is a dry etcher used in semiconductor processing, with models supporting 8-inch (200 mm) wafers.

    CategoryEtch
    10 specs
  5. Centura 5200 EPI ReactorApplied Materials

    Applied Materials Centura 5200 EPI Reactor is an epitaxial reactor configured with three atmospheric epi chambers and one cool-down chamber.

    CategoryDeposition
    13 specs
  6. Centura 5200 ES MxP PolyApplied Materials

    The Applied Materials Centura 5200 ES MxP Poly is an etch system that handles 8-inch wafers.

    CategoryEtch
    4 specs
  7. Centura 5200 High KApplied Materials
    CategoryDeposition
    4 specs
  8. Centura 5200 HTF EPIApplied Materials

    Applied Materials Centura 5200 HTF EPI is an epitaxial silicon deposition system for 8-inch wafers.

    CategoryDeposition
    8 specs
  9. Centura 5200 HTF RP EPIApplied Materials

    Applied Materials Centura 5200 HTF RP EPI is a reduced-pressure epitaxial silicon deposition system.

    CategoryDeposition
    5 specs
  10. Centura 5200 MainframeApplied Materials

    The Applied Materials Centura 5200 Mainframe is a semiconductor wafer processing platform used in fabrication facilities.

    CategoryLab & Support Equipment
    1 spec
  11. Centura 5200 MetalApplied Materials

    Applied Materials Centura 5200 Metal is a CVD deposition system stated to support 8-inch wafers.

    CategoryDeposition
    1 spec
  12. Centura 5200 MXP+Applied Materials

    The Applied Materials Centura 5200 MXP+ is a 200 mm etch system configured with Poly, Dielectric, or chamber-based MxP variants in the provided sources.

    CategoryEtch
    44 specs
  13. Centura 5200 MXP+ TungstenApplied Materials
    CategoryEtch
    8 specs
  14. Centura 5200 WXZApplied Materials
    3 specs
  15. Centura 5200 WXZ MetalApplied Materials

    The Applied Materials Centura 5200 WXZ Metal is a chemical vapor deposition (CVD) system for 8-inch wafers.

    CategoryDeposition
    6 specs

Sources

Sources (5)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]Equipment inventory listing
  3. [3]Equipment inventory listing
  4. [4]fabsurplus.comfabsurplus.com
  5. [5]Equipment inventory listing