Tokyo Electron
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Tokyo Electron Indy is a deposition tool. The Tokyo Electron Indy-B-L is used for a HiK dielectric process. The Tokyo Electron Indy-B-L has a wafer size of 300mm.[1][2]
The Tokyo Electron Indy is a batch furnace system used for thermal processing and deposition in semiconductor manufacturing. The tool operates as a vertical furnace, processing multiple wafers simultaneously in a controlled gas ambient. Systems of this class perform thermal oxidation, diffusion, and chemical vapor deposition (CVD) or atomic layer deposition (ALD) of thin films.
The Tokyo Electron Indy is a vertical furnace in which a batch of wafers is loaded into a quartz boat and inserted into a heated process tube. Gases are introduced at controlled flow rates and pressures, and the wafer temperature is ramped to the desired process setpoint. Film deposition occurs through thermal decomposition or surface reactions. The system supports multiple gas lines for processes such as nitride deposition and high‑k dielectric formation.
Documented failure modes, common issues, and field considerations.
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| Indy-B-L | — | 2010–2010 | HiK dielectric process | agsemiconductor.com[2] |
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
No research found yet — worked with this tool? Share what you know.
The following facts about the Indy are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Indy are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the Indy are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the Indy is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the Indy are on record.
Answerable by: an OEM parts catalog or a service engineer
No publicly hosted manuals, SOPs, or datasheets for the Indy are on record.
Answerable by: university cleanroom staff or an OEM application specialist
Last updated Oct 5, 2026.
The Applied Materials 0010-13622 is an RF match unit intended for PVD (Physical Vapor Deposition) described as a High Efficiency HE RF Match-Bias.
The Applied Materials 0020 12458 Part is an insulator, side match component for the Hdp-Cvd Ultima Plus system.