Tokyo Electron
Alpha 303 i K
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Tokyo Electron Alpha 303 i K is a thermal/diffusion furnace for 12-inch wafers. The Alpha 303 i K is part of the Tokyo Electron Alpha 303 family of thermal processing tools. The Alpha 303 i K includes a handler system with a loadport and supports a Factory Interface using FOUP (Front Opening Unified Pod) wafer carriers.[1]
What it is
The Tokyo Electron Alpha 303 i K is a thermal / diffusion furnace used in semiconductor manufacturing.[1]
The Alpha 303 i K is part of the Tokyo Electron Alpha 303 family of thermal processing tools.[1]
How it works
Where it fits in the process flow
General reference — not yet source-verifiedThermal / diffusion furnaces are used in semiconductor fabrication for batch processes such as thermal oxidation, diffusion of dopants, low-pressure chemical vapor deposition (LPCVD), and annealing.
Applications
General reference — not yet source-verifiedThe Alpha 303 i K is used in thermal and diffusion processes within semiconductor device fabrication.
What do the numbers mean?
Wafer handling3
Control & software2
Configuration & options10
Vintage & configurations
Documented models & variants
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What temperature ranges are typically achieved in this class of equipment?General reference — not yet source-verified
Thermal/diffusion furnaces of this type are capable of operating across a wide range of temperatures, from moderate values for low-temperature oxide deposition up to high temperatures needed for dopant drive-in and annealing. Precise multi-zone control maintains uniformity within fractions of a degree across the process tube.
What is the typical batch size for a vertical furnace of this class?General reference — not yet source-verified
Batch size depends on the tube diameter and wafer size, but such systems are designed to process multiple wafers simultaneously, often arranged in a vertical boat. The exact number varies by configuration and is optimized for throughput and uniformity.
How is process uniformity maintained across the wafer stack?General reference — not yet source-verified
Multi-zone heating elements, gas flow distribution plates, and carefully designed temperature ramp rates ensure that each wafer experiences nearly identical thermal and chemical conditions. Additionally, periodic calibration and tube cleaning procedures sustain long-term uniformity.
Not publicly documented
The following facts about the Alpha 303 i K are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Alpha 303 i K are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the Alpha 303 i K are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Alpha 303 i K are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Alpha 303 i K is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the Alpha 303 i K are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]waferpedia.com — waferpedia.comwaferpedia.com
- [2]Inventory photo
- [3]inventory listing
- [4]inventory listing
Last updated Oct 1, 2026.
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