Pfeiffer
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
Wafer size
100mm
Vacuum
Chamber primary pump[1]
Process applications and technology nodes documented for this tool.
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
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It is the chamber primary pump.[1]
It is dedicated to coating conductive layers to prepare non-conductive samples for e-beam exposure and avoid charging issues.[1]
The system handles 100 mm wafers, thick 100 mm wafers using the shuttle for chips if thickness exceeds 700 µm, and 150 mm wafers.[1]
The following facts about the ACP040G are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the ACP040G are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the ACP040G are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the ACP040G are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the ACP040G are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the ACP040G is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Last updated Sep 25, 2026.
The STS 310 is a plasma-enhanced chemical-vapor-deposition system used in the source to deposit silicon dioxide and silicon nitride films.
The Pfeiffer Adixen ACP28G is a compact dry rotary lobe vacuum pump designed for pumping traces of corrosive gas, featuring a frictionless multi-stage roots design and an integrated frequency converter.
The Pfeiffer ATH1603M is a magnetically levitated turbomolecular pump used for high vacuum applications.
The Temescal FC-2000 is a load-locked bell jar deposition system for small-scale production and R&D, with listed substrate fixtures for 2-inch, 3-inch, 100-mm, and 150-mm wafers.