Oxford Instruments
100
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Oxford 100 is a plasma-enhanced chemical vapor deposition (PECVD) system. The Oxford 100 is specifically designed to produce excellent uniformity and high rate films with control over properties such as refractive index, stress, electrical characteristics, and wet chemical etch rate. The Oxford 100 is compatible with wafer sizes up to 200 mm.[1][2]
Performance
Excellent uniformity and high rate films[2]
Gas delivery
Via showerhead gas inlet in top electrode[2]
What is it?
What do the numbers mean?
Power & electrical1
- Electrode configuration
- Top electrode RF driven (MHz and/or kHz); no RF bias on lower (substrate) electrode[2]
Wafer handling2
Gas & chemistry2
Performance1
Control & software2
Configuration & options1
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What is the name of the specific PECVD model series developed by Oxford Instruments?
The Oxford Instruments PlasmaPro 100 is a PECVD series, with the PlasmaPro 100 PECVD being a specific product line designed for excellent uniformity and high rate films.[2]
What is the role of the showerhead gas inlet in the PlasmaPro 100 PECVD?
Gas is injected into the process chamber via a 'showerhead' gas inlet in the top electrode, which helps ensure uniform distribution.[2]
Not publicly documented
The following facts about the 100 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 100 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 100 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 100 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 100 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 100 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]Equipment inventory listing
- [2]plasma.oxinst.com — plasma.oxinst.complasma.oxinst.com
Last updated Sep 23, 2026.
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