Onto Innovation
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The Nanospec 3000 is manufactured by Onto Innovation, formerly Nanometrics. The system can measure up to three layers of film on a substrate. The system can support up to 200 different measurement programs or recipes. The measurement time is less than three seconds. The system processes wafers up to 150 mm in diameter.[2][4]
The Nanospec 3000 operates on the principle of spectroscopic reflectometry. The system measures the interference spectrum of light reflected from a transparent film on a substrate. The system uses a computer-controlled grating monochromator to select specific wavelengths of light from a broad-spectrum source. The light is directed through an optical microscope onto the sample, and the reflected light is collected by a photomultiplier tube detector. The interference pattern, caused by constructive and destructive interference of light reflecting from the film's top and bottom surfaces, is analyzed by proprietary algorithms to calculate film thickness and refractive index.[3][2]
The system includes a dual wafer stage: one side holds a reference wafer for calibration, and the other holds the sample to be measured. Before each measurement session, the operator performs a reference calibration sequence. The microscope can be focused using coarse and fine adjustment knobs. The system includes tabs for adjusting the field of view and aperture, and a filter for measuring photo-resist. The operator selects a measurement program from a list, focuses on the sample, and initiates a measurement. The computer screen displays the film thickness and a goodness-of-fit value indicating the quality of the measurement.[3]
The system can measure film thicknesses over a range from about 250 angstroms to 35 micrometers. The measurement spot size is 25 micrometers when using a 10X objective. The system offers a wavelength range from 480 nm to 800 nm for its measurements. The system provides reproducibility of less than 2 angstroms for film thickness measurements. The performance includes the ability to measure up to three layers of film. The measurement time can vary from 0.25 seconds to 4 seconds per measurement site. The system includes data management capabilities such as statistical analysis and data export.[1][2]
Documented failure modes, common issues, and field considerations.
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The following facts about the Nanospec 3000 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Nanospec 3000 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Nanospec 3000 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Nanospec 3000 are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the Nanospec 3000 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the Nanospec 3000 are on record.
Answerable by: an OEM parts catalog or a service engineer
Last updated Sep 29, 2026.