Lam Research
TCP 9400
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
Where it fits in the process flow
Common process applications include polysilicon and polycide etching as well as shallow trench isolation (STI) formation. The tool is also used for silicon nanocone and metasurface pattern transfer via reactive ion etching with chlorine and bromine chemistries.[1][4][5]
Applications
What do the numbers mean?
Power & electrical2
Vacuum & pumping1
Wafer handling5
Gas & chemistry1
- Gases
- Chlorine, He/O2, Helium, Hydrogen Bromide, Nitrogen, Oxygen, Perfluoroethane, Tetrafluoromethane[2]
Control & software1
Dimensions & facilities1
Configuration & options8
- Single chamber stand-alone[1]
Vintage & configurations
- 1996Production start[1]
Vintage year 1996 as per serial #4055
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| TCP 9400 SE | — | 1996 | Model 9408, Rainbow platform, Envision v1.4, single chamber stand-alone, ceramic free chamber with waferless auto clean, 8-inch wafer size, cassette to cassette transport | photonicmicrodevices.com[1] |
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Which gases are used in the TCP 9400?
The tool uses chlorine (Cl2), hydrogen bromide (HBr), oxygen (O2), helium (He), nitrogen (N2), perfluoroethane (C2F6), and tetrafluoromethane (CF4) as process gases.[2]
What is the maximum etch depth of the TCP 9400?
The maximum etch depth is 3 micrometers for certain processes.[2]
What type of plasma source does the TCP 9400 use?
The TCP 9400 uses a transformer coupled plasma (TCP) source, which is a form of inductively coupled plasma (ICP) generated by a planar coil operating at 13.56 MHz.[2][1]
What platform is the TCP 9400 based on?
The TCP 9400 is part of the Lam Research Rainbow platform.[1]
Not publicly documented
The following facts about the TCP 9400 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
The control-system platform and OS era of the TCP 9400 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the TCP 9400 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the TCP 9400 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the TCP 9400 are on record.
Answerable by: an OEM parts catalog or a service engineer
No publicly hosted manuals, SOPs, or datasheets for the TCP 9400 are on record.
Answerable by: university cleanroom staff or an OEM application specialist
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (5)Every fact above is drawn from these public sources
- [1]photonicmicrodevices.com — photonicmicrodevices.comphotonicmicrodevices.com
- [2]snfguide.stanford.edu — snfguide.stanford.edusnfguide.stanford.edu
- [3]Equipment inventory listing
- [4]https://link.springer.com/content/pdf/10.1186/s11671-015-0865-8.pdf — link.springer.comlink.springer.com
- [5]https://www.nature.com/articles/s41467-023-39721-w.pdf — nature.comnature.com
Last updated Sep 26, 2026.