Lam Research
SEZ SP 203
How it works
The SP 203 tool uses Bernoulli handling and a pinless chuck to support the wafer during processing, enabling non-contact or minimal-contact wafer transport. The machine's electrical specification is 200-208 V, 50/60 Hz, three-phase, with a current rating of 50.0 A. Exhaust is directed upward, and the tool contains three chemistry cabinets: two cabinets each have a main tank and buffer tank, while the third cabinet has a main tank.[1][2]
Why won't it start?
Documented failure modes, common issues, and field considerations.
- Keyboard switching
- Voltage fluctuations
What do the numbers mean?
Power & electrical6
Vacuum & pumping2
- Exhaust Up[1]
Wafer handling4
Gas & chemistry4
Control & software4
Configuration & options13
Vintage & configurations
- 1998Vintage[1]
The SEZ SP 203 is described as 1998 vintage.
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| SEZ SP 203 Spin | — | — | Listed as a spin etcher. | waferpedia.com[3] |
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Configuration200-208 V[1]
- Configuration50/60 Hz[1]
- Phase3 Phase[1]
- ConfigurationExhaust Up[1]
- Configuration3 Chemistry Cabinets[1]
- ConfigurationChemistry Controller[1]
- ConfigurationChemistry computer replaced (not original)[1]
- Power200-208 V[1]
- Frequency50/60 Hz[1]
- Vacuum exhaustExhaust Up[2]
- Chemistry cabinets3 Chemistry Cabinets[2]
- Known problemsKeyboard switching; Voltage fluctuations[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What kind of process does the SP 203 Spin perform?
The SP 203 Spin is a spin etcher used for wet etching applications.[3][4]
What power supply does the SP 203 require?
The cleaning configuration requires 200-208 V, 50/60 Hz, three-phase power at 50.0 A, while the Spin version is specified as 400 VAC, 50 Hz, three-phase with a maximum current of 32 A.[1][2][3]
How is the wafer handled in the SP 203?
The SP 203 uses Bernoulli handling with a pinless chuck for 6-inch wafers.[1][2]
Not publicly documented
The following facts about the SEZ SP 203 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
The control-system platform and OS era of the SEZ SP 203 are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the SEZ SP 203 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the SEZ SP 203 are on record.
Answerable by: an OEM parts catalog or a service engineer
No publicly hosted manuals, SOPs, or datasheets for the SEZ SP 203 are on record.
Answerable by: university cleanroom staff or an OEM application specialist
No description of the SEZ SP 203 is on record.
Answerable by: an engineer who operated it or an OEM application specialist
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]Equipment inventory listing
- [2]waferpedia.com — waferpedia.comwaferpedia.com
- [3]waferpedia.com — waferpedia.comwaferpedia.com
- [4]LAM / SEZ SP 203 Spin Etcher - CSI Semi — csisemi.comcsisemi.com
Last updated Oct 4, 2026.
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