Lam Research
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The Lam / Novellus / Gasonics Inova is a Physical Vapor Deposition (PVD) system. The Inova processes 8-inch wafers.[1]
The Lam Research Gasonics Inova is a physical vapor deposition system for semiconductor manufacturing.[1][2][3][4]
A physical vapor deposition tool forms thin films by depositing material from a vapor phase onto wafer surfaces.
A deposition system of this class is used to coat semiconductor substrates with engineered layers that become part of later device and interconnect structures.
The Inova sits in the thin-film deposition portion of the fab flow, where wafers receive a deposited layer before later patterning or integration steps.
Physical vapor deposition is generally used after prior wafer preparation steps and before downstream lithography, etch, or planarization steps that rely on the deposited film.
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The following facts about the Gasonics Inova are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Gasonics Inova are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Gasonics Inova are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Gasonics Inova are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Gasonics Inova are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Gasonics Inova is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 7, 2026.
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