Waferpedia

KLA

SFS 6100 Wafer Surface Analysis

Metrology & InspectionKLA SFS family
Research Quality: 40% complete

The KLA SFS 6100 is a non-patterned wafer inspection system. The KLA SFS 6100 uses a laser-scattering technique to identify particles, scratches, pits, and other micro-defects. The KLA SFS 6100 has a sensitivity down to approximately 0.16 µm.[1]

SFS 6100 Wafer Surface Analysis — Inventory photo
Fig. 01SFS 6100 Wafer Surface AnalysisInventory photo[2]

What it is

The KLA SFS 6100 is a wafer surface analysis system. The KLA SFS 6100 is a non-patterned wafer inspection system.[3][1]

Where it fits in the process flow

The KLA SFS 6100 fits into wafer inspection and metrology activity for bare wafers and process wafers. The system is used on non-patterned wafers rather than on completed circuit patterns.[3][1]

What do the numbers mean?

Power & electrical4

Voltage
208 V[3]
Accurate?
Single Phase[2]
Accurate?
Frequency
60 Hz[3]
Accurate?
Phase
Single Phase[3]
Accurate?

Wafer handling2

Wafer Size
4" to 8"[1]
Accurate?
Wafer Size
4 to 8 inch[3]
Accurate?

Configuration & options3

17 A[2]
Accurate?
Sensitivity
~0.16 µm[1]2 sources
Accurate?
Current
17 A[3]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Voltage208 V[3]
  • ConfigurationSingle Phase[2]
  • Frequency60 Hz[3]
  • PhaseSingle Phase[3]

Where are the manuals?

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Not publicly documented

Field notes

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Frequently asked questions

What is the KLA SFS 6100?

The KLA SFS 6100 is a wafer surface analysis system, specifically a non-patterned wafer inspection system.[3][1]

What manufacturer and model are identified?

The manufacturer is KLA and the model is SFS 6100, also known as the Surfscan SFS 6100.[2][1]

What wafer sizes does the KLA SFS 6100 support?

The system supports wafer sizes ranging from 4 inches to 8 inches.[1]

What is the defect detection sensitivity of the KLA SFS 6100?

The sensitivity is down to approximately 0.16 µm.[1]

What are the electrical power requirements of the KLA SFS 6100?

The system requires 208 V, single phase, 60 Hz, and draws 17 A.[2][3]

Not publicly documented

The following facts about the SFS 6100 Wafer Surface Analysis are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the SFS 6100 Wafer Surface Analysis are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the SFS 6100 Wafer Surface Analysis are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the SFS 6100 Wafer Surface Analysis are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the SFS 6100 Wafer Surface Analysis are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the SFS 6100 Wafer Surface Analysis is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (3)Every fact above is drawn from these public sources
  1. [1]slideserve.com — slideserve.comslideserve.com
  2. [2]Inventory photo
  3. [3]waferpedia.com — waferpedia.comwaferpedia.com
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Last updated Oct 3, 2026.

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