KLA
8 XXX CD-SEM
The KLA 8 XXX CD-SEM is a replacement part for the energy filter/scintillator assembly in KLA CD-SEM systems. The 8 XXX CD-SEM is compatible with KLA models 8100, 8100XP, 8200, and 8250. The 8 XXX CD-SEM is not intended for systems with an MCP detector.[1][2]
What it is
The KLA 8 XXX CD-SEM is a critical dimension scanning electron microscope used for metrology and inspection in semiconductor manufacturing.[1][2]
The system is categorized under metrology and inspection equipment and is part of the KLA 8 XXX family of CD-SEM tools.[2]
How it works
General reference — not yet source-verifiedA CD-SEM uses a focused beam of electrons to scan the surface of a semiconductor wafer, generating high-resolution images of pattern features.
The instrument measures critical dimensions such as line widths, spacing, and contact hole diameters by analyzing the secondary electron signal produced during scanning.
Where it fits in the process flow
General reference — not yet source-verifiedCD-SEMs are used in process control after lithography and etch steps to verify that feature sizes meet design specifications.
The tools are typically located in a fab's metrology bay and provide feedback for adjusting exposure dose, focus, and etch parameters.
Applications
General reference — not yet source-verifiedCD-SEMs are applied in advanced semiconductor fabrication for in-line monitoring of critical dimensions at advanced technology nodes.
The KLA 8 XXX CD-SEM is suited for measuring patterns on photomasks and wafers during research, development, and production.
What do the numbers mean?
Optics & imaging2
- Not for systems with MCP detector[1]
Dimensions & facilities1
Configuration & options10
- Replacement for KLA part number 720-12647-000[1]
- Compatible with:[1]
- 8100XP[1]
- Less potential to arc from energy filter to scintillator.[1]
- Less potential to arc from energy filter to ground mesh.[1]
- Stranger and more stable mesh structure.[1]
- Longer life than previous version.[1]
- Improvements over previous version
- Less potential to arc from energy filter to scintillator; less potential to arc from energy filter to ground mesh; stronger and more stable mesh structure; longer life[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the 8 XXX CD-SEM are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 8 XXX CD-SEM are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 8 XXX CD-SEM are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 8 XXX CD-SEM are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 8 XXX CD-SEM are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 8 XXX CD-SEM is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]8 XXX CD-SEM — KLA | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
Last updated Oct 10, 2026.
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