GCA
200
The GCA 200 is an i-line (365 nm) wafer stepper. The GCA 200 is a step-and-repeat exposure tool for lithography. The GCA 200 supports wafers up to 6 inches in diameter.[1]
Wafer size
up to 6-inch diameter wafers; substrate size approximately 10 x 10 mm up to 100 mm, with 150 mm possible
Node / era
i-line
Optics
i-line (365 nm)[1]
What it is
How it works
Applications
The GCA 200 is used for lithography that requires high resolution and critical alignment.[1]
The GCA 200 supports manual wafer loading, piece parts smaller than ten millimeters by ten millimeters, and substrates up to six-inch diameter wafers.[1]
The GCA 200 is used for i-line exposure at 365 nanometers.[1]
- Lithography requiring high resolution
- Lithography requiring critical alignment
What do the numbers mean?
Wafer handling4
Optics & imaging7
Performance1
- Alignment tolerance
- Better than 0.25 um global alignment; better than 0.15 um local alignment[1]
Control & software1
Configuration & options4
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What kinds of substrates can the GCA 200 handle?
The GCA 200 supports piece parts smaller than ten millimeters by ten millimeters and wafers up to six-inch diameter.[1]
What lens does the GCA 200 use?
The GCA 200 uses an Olympus 2145 lens with numerical aperture 0.45.[1]
What reduction ratio does the GCA 200 apply to the mask image?
The GCA 200 reduces the mask image by 5x.[1]
Not publicly documented
The following facts about the 200 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 200 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 200 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 200 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 200 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
No publicly documented compatible parts, consumables, or accessories for the 200 are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (1)Every fact above is drawn from these public sources
- [1]wiki.nanotech.ucsb.edu — wiki.nanotech.ucsb.eduwiki.nanotech.ucsb.edu
Last updated Oct 9, 2026.
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