Waferpedia

CHA

Mark 40 E-Beam

DepositionCHA Mark 40 E-Beam family
Research Quality: 40% complete

Provisional entry — research in progress

This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

CHAMark 40 E-Beam
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Power

CHA SR10 electron beam power supply[2]

Vacuum

CTI 8[2]

Optics

4-pocket, up to 4 metal materials[2]

What it is

The CHA Mark 40 is an electron-beam evaporator used for physical vapor deposition in semiconductor and thin-film processing.[1][2]

How it works

The CHA Mark 40 is equipped with a four-pocket electron-beam gun that can hold up to four different metal materials, enabling sequential deposition without breaking vacuum.[2]

The system includes a CHA SR10 electron-beam power supply, an Autotech II valve controller, and a CTI 8 cryopump with a CTI compressor, which maintain the high-vacuum environment required for clean deposition.[2]

Applications

General reference — not yet source-verified

E-beam evaporators are used for depositing metal layers, contacts, and interconnects in semiconductor devices, as well as for optical coatings, magnetic thin films, and other thin-film applications.

What do the numbers mean?

Power & electrical1

Power Supply
CHA SR10 electron beam power supply[2]
Accurate?

Vacuum & pumping1

Cryopump
CTI 8[2]
Accurate?

Wafer handling1

Wafer Size
200 mm (version)[3]
Accurate?

Optics & imaging1

Electron Beam Gun
4-pocket, up to 4 metal materials[2]
Accurate?

Control & software1

Valve Controller
Autotech II[2]
Accurate?

Configuration & options3

Type
E-Beam Evaporator[1]
Accurate?
Process
Physical Vapor Deposition (PVD)[2]
Accurate?
Compressor
CTI[2]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Power SupplyCHA SR10 electron beam power supply[2]
  • CryopumpCTI 8[2]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Not publicly documented

The following facts about the Mark 40 E-Beam are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Mark 40 E-Beam are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the Mark 40 E-Beam are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the Mark 40 E-Beam are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the Mark 40 E-Beam are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the Mark 40 E-Beam is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (3)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]semistarcorp.com — semistarcorp.comsemistarcorp.com
  3. [3]fabsurplus.comfabsurplus.com
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Last updated Sep 22, 2026.

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