Canon
The Canon Anelva C7100 PVD Cluster is a physical vapor deposition system for 8-inch wafers. The Canon Anelva C7100 PVD Cluster includes triple transfer chambers with Brooks Magna-Tran robots. The Canon Anelva C7100 PVD Cluster features multiple process modules including CIS CH-A, Etch/OXI-EX, 8PVD-EX, 5PVD-EX, Cooling, RTA, and others.[1]
The Canon Anelva C 7100 PVD Cluster is a physical vapor deposition system for semiconductor processing.[1][2]
The Canon Anelva C 7100 is configured for eight-inch wafers.[1]
The Canon Anelva C 7100 includes triple transfer chambers with a loadlock and cluster-to-cluster transport, and the system uses Brooks Magna-Tran robots for wafer movement between modules.[1]
The Canon Anelva C 7100 includes multiple process modules, including CIS CH-A, Etch/OXI-EX CH-B, 8PVD-EX CH-E, 5PVD-EX CH-F, 8PVD-EX CH-1A, Cooling CH-1B, RTA CH-1C, 4/4PVD-1D, and 4PVD-EX CH-1F.[1]
The Canon Anelva C 7100 is used for sputtering deposition and related physical vapor deposition workflows.[2][1]
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The following facts about the Anelva C 7100 PVD Cluster are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
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Last updated Oct 5, 2026.
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