ASML
The PAS 5500/100 is an i-line step-and-repeat lithography system, belonging to ASML's PAS 5500 family of wafer steppers. Steppers of this class project the image of a reticle onto a semiconductor wafer in a step-and-repeat manner, exposing one field at a time before stepping to the next field. The PAS 5500/100 was specifically designed for i-line (365 nm wavelength) lithography and was introduced as a solution for leading-edge volume production at the 0.40 micron technology node.[2]
The PAS 5500/100 is an i-line step-and-repeat (stepper) system, meaning it uses a projection lens to image a reticle pattern onto the wafer one field at a time. The wafer is mounted on a precision stage that steps between exposure fields. The system uses an i-line mercury arc lamp as its illumination source, producing light at 365 nm wavelength. Alignment is performed using alignment marks on the wafer, allowing accurate overlay between layers.[2]
Documented failure modes, common issues, and field considerations.
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The following facts about the PAS 5500 100 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the PAS 5500 100 are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the PAS 5500 100 are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the PAS 5500 100 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the PAS 5500 100 are on record.
Answerable by: an OEM parts catalog or a service engineer
No publicly hosted manuals, SOPs, or datasheets for the PAS 5500 100 are on record.
Answerable by: university cleanroom staff or an OEM application specialist
Last updated Oct 5, 2026.
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