ASML PAS 5500

Models in this family

1. 

   PAS 5500introduced 2000produced 2000–2010i-lineLegacy

   The ASML PAS 5500/275D is a high-throughput i-line stepper with 5X reduction, 365 nm exposure, and automated wafer handling for substrates up to 200 mm diameter.

   Cited variants

   Designation	Generation	Vintage	Changes	Source
   PAS 5500/275D	i-line	—	High-throughput i-line stepper using 365 nm light; 5X reduction and projection capability; automated wafer handling for substrates from 200 mm diameter wafers down to small pieces.	nist.gov[1]
   PAS 5500/60	i-line	—	Automatic 100 mm wafer cassette processing capability; 365 nm near-UV light; minimum feature size of 450 nm; 150 mm capable with advanced notice.	snfguide.stanford.edu[2]
   PAS 5500/350C	—	2000–2010	DUV photolithography stepper using 248 nm KrF laser source; 4x or 5x reduction; high throughput; handles 100 mm wafers by default and 150 mm on request.	epfl.ch[3]
   PAS 5500/300	DUV	—	Described as a DUV stepper configured for 4-inch wafers.	wiki.nanotech.ucsb.edu[4]
   PAS 5500/200	i-line	—	Described as a 5X reduction, i-line stepper for 6 inch wafers using 6 inch reticles, with 350 nm resolution, 0.48-0.60 variable numerical aperture, 22x22 mm maximum field size, and better than 50 nm overlay capability.	manualslib.com[5]
   PAS 5500/400	Step & Scan	1995	Described as the second step & scan system released by ASML, with a 4X reduction ratio and maximum long-term mask overlay of 35 nm.	chiphistory.org[6]

2. PAS 5500 100

   The PAS 5500/100 is a step-and-repeat i-line lithography system from ASML, introduced for 0.40 micron production.

   Cited variants

   Designation	Generation	Vintage	Changes	Source
   PAS 5500/150	i-line	—	Described as the successor to the PAS 5500/100 i-line system and optimized for high-volume semiconductor production.	web.archive.org[7]
   PAS 5500/100D	—	—	—	web.archive.org[7]

3. 

   PAS 5500 100 D

   The ASML PAS 5500 100 D is a lithography system used in semiconductor manufacturing for patterning integrated circuit features onto wafers, belonging to the broader class of projection aligners that step and repeat or step and scan.

4. 

   PAS 5500 1100 Wafer
5. 

   PAS 5500 1150 C Wafer

   The ASML PAS 5500 / 1150 C is an 8-inch wafer stepper in the ASML PAS 5500 family with a Cymer NL7600A NanoLith laser system.

6. 

   PAS 5500 300 C

   The ASML PAS 5500/300 C is a DUV stepper with a 248 nm exposure wavelength and 8 inch wafer support.

   Cited variants

   Designation	Generation	Vintage	Changes	Source
   PAS 5500/300C	DUV	—	Capable of processing 88 200 mm wafers per hour and incorporates an AERIAL Illuminator.	web.archive.org[7]

7. 

   PAS 5500 300 C DUV

   ASML PAS 5500 / 300 C is a DUV stepper described as a deep ultraviolet lithography system.

   Cited variants

   Designation	Generation	Vintage	Changes	Source
   PAS 5500/300C	DUV	1996	Can be configured for 3 inch to 6 inch wafers; upgrade to 5500/300C via lens upgrade; upgraded workstation; extended N/A option; Cymer 5600 laser; laser chamber changed; laser path optics recently replaced; CM options listed include REFL Img Sensor, PEP 1, PEP 2, reticle error compensation, flatness model, LSQ Disto Model, mark sensor, batch streaming, intensity 2, aerial key, extended NA range, focal adjustment, alignment reports, annular illumination, scribblelane marks, library, and visual alignment camera.	Equipment inventory listing[8]

8. 

   PAS 5500 300 C Wafer
9. 

   PAS 5500 400 i-Line

   The ASML PAS 5500/400 is an i-line stepper for 8-inch wafers with a resolution of 280nm, introduced around 2002.

10. PAS 5500 60

    The ASML PAS 5500/60 is a sub-half-micron i-line stepper for 200 mm wafers with 450 nm resolution.

11. 

    PAS 5500 750
12. 

    PAS 5500 850 D

    The ASML PAS 5500/850 D is a scanner for 6-inch wafers, using a Cymer ELS-6610 light source and supporting R type, 1.2 mm notch and flat wafers.

Sources