Applied Materials
Centura DT Hart Oxide
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Applied Materials Centura DT Hart Oxide is an etcher for oxide etching, manufactured in 2002.[1]
What it is
General reference — not yet source-verifiedThe Applied Materials Centura DT Hart Oxide is an oxide etch system used in semiconductor manufacturing. The Centura platform is a modular cluster tool platform from Applied Materials. The DT Hart Oxide configuration is designed for dielectric etching.
How it works
General reference — not yet source-verifiedThe Centura DT Hart Oxide uses a plasma etching process to remove oxide material. Plasma is generated in a process chamber using radio frequency power applied to electrodes. Reactive gases containing fluorine are introduced to chemically etch silicon dioxide. The system may use dual-frequency capacitive coupling to control ion energy and plasma density.
Where it fits in the process flow
General reference — not yet source-verifiedOxide etching typically follows the deposition of a silicon dioxide layer. The oxide etch step defines features such as contact holes and vias for subsequent metallization. The Centura DT Hart Oxide is used in the dielectric etch step of the semiconductor fabrication flow.
What do the numbers mean?
Where are the manuals?
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Not publicly documented
Field notes
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Frequently asked questions
What is the Applied Materials Centura DT Hart Oxide?
The Applied Materials Centura DT Hart Oxide is an oxide etcher used in semiconductor manufacturing.[1][2]
What platform is the Centura DT Hart Oxide based on?
The Centura DT Hart Oxide is based on the Applied Materials Centura platform.[1]
What category of equipment is the Centura DT Hart Oxide?
The Centura DT Hart Oxide is categorized as an etch tool for oxide materials.[2]
Not publicly documented
The following facts about the Centura DT Hart Oxide are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
Fewer than 3 independently cited specifications for the Centura DT Hart Oxide are on record; the remainder await public documentation.
Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Centura DT Hart Oxide are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Centura DT Hart Oxide are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Centura DT Hart Oxide are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Centura DT Hart Oxide are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
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Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]Equipment inventory listing
- [2]Centura DT Hart Oxide — Applied Materials | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
Last updated Sep 24, 2026.
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