Applied Materials
Centura AP eMax CT+
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
How it works
General reference — not yet source-verifiedAn etch tool removes selected material from a wafer by exposing the surface to a controlled plasma or reactive gas environment.
An etch system in this class uses a process chamber, gas delivery, and process control to shape material removal with pattern fidelity set by the mask and resist pattern on the wafer.
Where it fits in the process flow
General reference — not yet source-verifiedThe Centura AP eMax CT+ sits in the pattern-transfer portion of the fab flow after lithographic pattern definition.
The Centura AP eMax CT+ supports material removal steps that follow photoresist patterning and precede downstream strip and clean operations.
Applications
What do the numbers mean?
Wafer handling1
Configuration & options9
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the Centura AP eMax CT+ are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Centura AP eMax CT+ are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Centura AP eMax CT+ are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Centura AP eMax CT+ are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Centura AP eMax CT+ are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Centura AP eMax CT+ is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]fabsurplus.com — fabsurplus.comfabsurplus.com
- [2]waferpedia.com — waferpedia.comwaferpedia.com
- [3]Equipment inventory listing
- [4]Applied Materials CENTURA AP EMAX CT+ Chamber Only for sale — fabsurplus.comfabsurplus.com
Last updated Oct 3, 2026.
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