AJA
9856 IRC
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The AJA 9856 IRC is a sputtering system manufactured by AJA. The AJA 9856 IRC is categorized as deposition equipment.[1][2]
What it is
The AJA 9856 IRC is a sputtering system used for thin film deposition.[1]
How it works
General reference — not yet source-verifiedIn a sputtering system a plasma is struck in a low-pressure gas atmosphere, typically argon, inside a vacuum chamber. Positively charged argon ions are accelerated toward a negatively biased target (the material to be deposited) and eject atoms from the target surface through momentum transfer. The ejected atoms travel in a line-of-sight path and condense onto the substrate, forming a thin film. The process chamber is evacuated before deposition to reduce contamination.
Applications
General reference — not yet source-verifiedCommon applications for sputtering systems include the deposition of metal contacts, barrier layers, and adhesion layers in semiconductor devices. The technology is also used to produce reflective coatings, magnetic thin films for data storage, and optical coatings. Sputtering is favored for its ability to produce uniform films with controlled stoichiometry and good adhesion to the substrate.
What do the numbers mean?
No specifications recorded yet
Be the first to add cited specifications for this tool.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the 9856 IRC are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No specifications for the 9856 IRC are on record.
Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 9856 IRC are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 9856 IRC are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 9856 IRC are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 9856 IRC are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]Equipment inventory listing
- [2]9856 IRC — AJA | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
Last updated Sep 29, 2026.
Compare with similar tools
View all →
The Applied Materials 0010-13622 is an RF match unit intended for PVD (Physical Vapor Deposition) described as a High Efficiency HE RF Match-Bias.
The Applied Materials 0020 12458 Part is an insulator, side match component for the Hdp-Cvd Ultima Plus system.