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Aixtron

2800 G 4 HT MOCVD Reactor

DepositionAixtron 2800 G 4 HT MOCVD Reactor family
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The Aixtron 2800 G 4 HT MOCVD Reactor is a metal organic chemical vapor deposition system used for InGaN MOCVD epitaxy. The Aixtron 2800 G 4 HT MOCVD Reactor processes 6 x 6" wafers. The Aixtron 2800 G 4 HT MOCVD Reactor uses an RF coil with Trumpf Hunttinger RF Generator TruHeat 7120 as its heating system.[1][2][3]

2800 G 4 HT MOCVD Reactor — Inventory photo
Fig. 012800 G 4 HT MOCVD ReactorInventory photo[1]

Vacuum

Custom Built Exhaust System[1]

Gas delivery

Individual GFR Control for Each Puck[1]

What it is

The Aixtron 2800 G 4 HT MOCVD Reactor is a metal organic chemical vapor deposition tool used for deposition.[1][3]

The reactor family contains the 2800 G 4 HT MOCVD Reactor model.[4]

How it works

The Aixtron 2800 G 4 HT MOCVD Reactor uses an RF coil heating system, custom built exhaust, process pumping, and reactor chillers.[1][3]

The Aixtron 2800 G 4 HT MOCVD Reactor includes a nitrogen glovebox, in situ pyrometry, and individual gas foil rotation control for each puck.[1][3]

Where it fits in the process flow

The Aixtron 2800 G 4 HT MOCVD Reactor is configured for InGaN MOCVD epitaxy on six by six inch wafers.[1][2][3]

Applications

The Aixtron 2800 G 4 HT MOCVD Reactor is used for InGaN MOCVD epitaxy.[1][2][3]

The Aixtron 2800 G 4 HT MOCVD Reactor handles metalorganic sources including TMIn, TMGa, TEGa, TMAl, and Cp2Mg, and hydride sources including NH3 and 100 ppm SiH4 in Ar.[1][2][3]

What do the numbers mean?

Power & electrical1

Heating System
RF Coil with Trumpf Hunttinger RF Generator TruHeat 7120[1]
Accurate?

Vacuum & pumping4

Custom Built Exhaust System[1]
Accurate?
Process Pump
Ebara ESA 70 W or ESA 80 W[1]
Accurate?
DOR & Glove Box Pumps
Adixen ACP - 15 x 2[1]
Accurate?
Exhaust System
Custom Built Exhaust System[1]
Accurate?

Wafer handling3

Wafer
6 x 6"[1]
Accurate?
Ceiling Temperature Control, Custom Built Automatic Ceiling Loader[1]
Accurate?
Ceiling Temperature Control
Ceiling Temperature Control, Custom Built Automatic Ceiling Loader[1]
Accurate?

Gas & chemistry2

Gas Foil Rotation (GFR)
Individual GFR Control for Each Puck[1]
Accurate?
Spare Channels
23 Spare MFC Channels & 10 Spare Valve Output Channels[1]
Accurate?

Control & software7

Software Version
AIXACT 7.4.1.99[1]
Accurate?
PLC
3.12.1 or 3.13.3 (depending on reactor)[1]
Accurate?
Glove Box
MBraun Nitrogen Glovebox with Controller[1]
Accurate?
In-Situ Pyrometry
Laytec Pyro 400 with EpiNET 2.2 for Feedback Temperature Control[1]
Accurate?
Software Version
AIXACT 7.4.1.9[2]
Accurate?
PLC; 3.12.1[2]
Accurate?
PLC
3.12.1[2]
Accurate?

Configuration & options22

SLC[1]
Accurate?
Process
InGaN MOCVD Epitaxy[1]
Accurate?
Metal Organic Source
TMIn x 3, TMGa x 2, TEGa x 2, TMAl x 1, Cp2Mg x 1, Future x 3[1]
Accurate?
Hydride Source
NH3 x 3, 100 ppm SiH4 in Ar x 2, Future x 2[1]
Accurate?
Concentration Monitors
Epison4 x 3 for TMIn, Epison4 x 1 for TMAl[1]
Accurate?
Chiller Baths (6 available for MO Sources)[1]
Accurate?
Purifiers
Entegris Getters for NH3, H2 & N2[1]
Accurate?
Filters[1]
Accurate?
Abatement
Unisem UN 2000 A-WHG (shared across 2 reactors)[1]
Accurate?
Reactor Chillers
Tek-Temp Recirculating Closed Loop Chiller[1]
Accurate?
Delivered as a CCS Reactor[2]
Accurate?
Upgraded[2]
Accurate?
SLC
SLC[1]
Accurate?
Metal Organic Sources
TMIn x 3, TMGa x 2, TEGa x 2, TMAl x 1, Cp2Mg x 1, Future x 3[1]
Accurate?
Hydride Sources
NH3 x 3, 100 ppm SiH4 in Ar x 2, Future x 2[1]
Accurate?
Chiller Baths
6 available for MO Sources[1]
Accurate?
Filters
Filters[1]
Accurate?
Reactor Chiller
Tek-Temp Recirculating Closed Loop Chiller[1]
Accurate?
In-Situ Pyrometry
In-Situ Pyrometry (available)[2]
Accurate?
Vintage
2008 to 2012 Vintage[1]
Accurate?
Vintage
2007 Vintage[2]
Accurate?
Delivered as a CCS Reactor - Upgraded[2]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Heating SystemRF Coil with Trumpf Hunttinger RF Generator TruHeat 7120[1]
  • ConfigurationCustom Built Exhaust System[1]
  • Process PumpEbara ESA 70 W or ESA 80 W[1]
  • DOR & Glove Box PumpsAdixen ACP - 15 x 2[1]
  • Exhaust SystemCustom Built Exhaust System[1]
  • Gas Foil Rotation (GFR)Individual GFR Control for Each Puck[1]
  • Spare Channels23 Spare MFC Channels & 10 Spare Valve Output Channels[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What process is the reactor configured for?

The reactor is configured for InGaN MOCVD epitaxy.[1][2][3]

What heating system does the reactor use?

The reactor uses an RF coil with a Trumpf Hunttinger RF generator TruHeat 7120.[1][3]

Not publicly documented

The following facts about the 2800 G 4 HT MOCVD Reactor are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 2800 G 4 HT MOCVD Reactor are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the 2800 G 4 HT MOCVD Reactor are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the 2800 G 4 HT MOCVD Reactor are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the 2800 G 4 HT MOCVD Reactor are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the 2800 G 4 HT MOCVD Reactor is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (4)Every fact above is drawn from these public sources
  1. [1]Inventory photo
  2. [2]Inventory photo
  3. [3]2800 G 4 HT MOCVD Reactor — Aixtron | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
  4. [4]Aixtron 2800 G 4 HT MOCVD Reactor family | Waferpedia — waferpedia.comwaferpedia.com
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Last updated Oct 11, 2026.

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