Filmetrics

The Filmetrics F80-A is a film thickness mapping tool for patterned wafers that combines full F80 functionality with Ricmar's WTT 300 Wafer Transfer Tool in a single EFEM platform.

The Filmetrics F20-EXR uses spectral reflectance for measuring ITO thickness and other display-layer films.

The Filmetrics R50 – 200 – 4PP is a metrology tool configured by default for metallic layers and sample thicknesses of 525 µm ± 25 µm.

The Filmetrics F-40-UV is a microscope-mounted optical reflectometer for rapid thin film thickness and optical constants measurements.

The Filmetrics R50-4PP is a four-probe measurement system for metal, conductive oxide, silicon, and polysilicon layers.

The Filmetrics F10-AR is an anti-reflection coating measurement system designed for ophthalmic anti-reflection coatings and hardcoats.

The Filmetrics F37 is an in-line thickness measurement system for measuring film thickness in-line and in real time at up to seven locations.

The Filmetrics F70 measures the thickness of glass and plastic materials up to 13 mm thick.

Filmetrics F80 is a thin-film thickness mapping system for product wafers that measures patterned wafers and generates thickness images.

The Filmetrics F60-t is a film thickness and index mapping instrument for production environments with automatic notch finding, on-board baselining, and an enclosed measurement stage with motion interlock.

The Filmetrics F80-C is a film thickness mapping tool for patterned wafers that uses Thickness Imaging technology to generate thickness images quickly.

The Filmetrics F10-HC is a hardcoat thickness measurement instrument based on the F20 platform that measures single- and multi-layer hardcoats using spectral reflectance analysis.

The Filmetrics F50-UV is a thin-film metrology tool that measures film thickness via spectroscopic reflectometry and can generate thickness uniformity maps.

The Filmetrics F54-XY-200 is an automated thickness mapping system with measurement range from 4 nm up to 35 µm.

The FilMetrics F20-UV is an optical measurement instrument listed in EPFL's Center of MicroNanoTechnology equipment pages.

The Filmetrics F10-RT is an optical spectrometer used for reflectivity measurements.

The Filmetrics F42 is a thin-film thickness measurement system for mapping thickness at over one-million points with spot sizes as small as 3 microns.

The Filmetrics F54 is a spectroscopic ellipsometer for measuring thin-film thickness and refractive index.

The Filmetrics F80-T is a film thickness mapping system for patterned wafers that uses Thickness Imaging technology.

The Filmetrics RS50 is a 4-point probe mapping system for sheet resistance measurement.

The Filmetrics F50 is an optical film thickness and wafer-mapping system for thickness and optical property measurements on substrates.

The Filmetrics 4PP is a sheet resistance measurement tool in the Characterization category.

The Filmetrics F40 is a film-thickness measurement instrument used for patterned films and reflectometry applications.

The Filmetrics F10-PA is a parylene thickness measurement system designed specifically for parylene thickness measurements.

The Filmetrics F60 is a film thickness and index mapping instrument for production environments.

The Filmetrics F10-VC is a simultaneous reflectance and transmittance measurement instrument with optional thickness and index measurement modules.

The Filmetrics F20 is an optical reflectometer used to measure film thicknesses of dielectrics, semiconductors, and thin metals.

Filmetrics F10-RT-UVX is a tool for measuring reflection/transmission spectra and optical film thickness.

Filmetrics F20s is a film-measurement instrument used in university teaching labs and for measuring thin-film thickness and optical properties in several application areas.

Profilm3D is a Filmetrics optical profiler used for profilometry-based film thickness measurements and 3D surface profiling.

The Filmetrics F30 is a spectral reflectance system for real-time thin-film deposition monitoring.