Waferpedia

Comparison ledger

ST 2700 Dual Stack Spin Rinseversus1000FP

Semitool ST 2700 Dual Stack Spin Rinse, YES 1000FP, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMSemitoolYES
CategoryWet Processing / CleanWet Processing / Clean
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilySemitool ST 2700 Dual Stack Spin RinseYES 1000FP
Specifications
System type—Plasma cleaning system[1]
Line—R-Series Plasma Cleaning Systems (Glen Technologies)[1]
Model—Glen/YES 1000FP[1]
Designed use—Designed to accept a range of shelf sizes[1]
Application focus—Changing needs of the flat panel industry[1]

Plan your fab

Building a Wet Processing / Clean process? Get a complete equipment list.

Open the fab equipment planner →
Sources (1)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org