Comparison ledger
Nikon NSR 2205 i 14 E, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | NSR 2205 i 14 ENikon | 150 e MaskSUSS MicroTec |
|---|---|---|
| OEM | Nikon | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Nikon NSR 2205 i 14 E | SUSS MicroTec 150 e Mask |
| Specifications | ||
| Category | Lithography[1] | — |
| Manufacturer | Nikon[2] | — |
| Model | NSR 2205 i 14 E[2] | — |
| Equipment Type | Stepper[2] | — |
| Vintage | 1999[2] | — |
| Wafer size | 200mm[1] | — |
| Throughput | ≧ 103 wafers/hour (200 mm wafer)[1] | — |
| Resolution | 0.35μm or better[1] | — |
| Numerical aperture | 0.63[1] | — |
| Exposure light source | i-line (365nm)[1] | — |
| Exposure field size | 22mm square to 17.9 (H) x 25.2 (V)mm[1] | — |
| Alignment system | LSA (standard), FIA (standard), LIA (optional)[1] | — |
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