Nikon
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The Nikon NSR 2205 i 14 E is an i-line stepper used for lithography on 200 mm wafers. The NSR 2205 i 14 E exposes with an i-line light source at 365 nm. The NSR 2205 i 14 E achieves a resolution of 0.35 μm or better.[1]
The Nikon NSR 2205 i 14 E is a stepper for photolithography.[2]
A stepper such as the NSR 2205 i 14 E operates by aligning a reticle containing the circuit pattern and projecting it through a reduction lens onto a wafer. The wafer is mounted on a precision stage that moves in a step-and-repeat fashion, exposing one die or field at a time. The system uses an illumination source, typically a mercury arc lamp filtered to a specific wavelength, to expose the photoresist. After each exposure, the stage moves to the next position and the process repeats until the entire wafer is patterned. Alignment systems measure marks on the wafer and reticle to maintain overlay accuracy between layers.
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The following facts about the NSR 2205 i 14 E are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the NSR 2205 i 14 E are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the NSR 2205 i 14 E are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the NSR 2205 i 14 E are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the NSR 2205 i 14 E are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the NSR 2205 i 14 E is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Sep 23, 2026.
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