Comparison ledger
Hitachi S 4800 II, KLA .498 PSL Wafer, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | S 4800 IIHitachi | |
|---|---|---|
| OEM | Hitachi | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Hitachi S 4800 | KLA .498 PSL Wafer |
| Specifications | ||
| Configuration | No HDD or EDX[1] | NIST Traceable[4] |
| Process Type | FA-SEMs/TEMs/Dual Beams[2] | — |
| LM mode | 20 ~ 2,000X[2] | — |
| HM mode | 100 ~ 800,000X[2] | — |
| Type KK | X: 0 ~ 110mm; Y: 0 ~ 110mm, Z: 1.5 ~ 40mm; T: -5 ~ +70*, R: 360*[2] | — |
| Operating System | Windows XP[2] | — |
| Tool type | Scanning electron microscope (SEM)[1] | — |
| Secondary electron image resolution | 1.0 nm (15 kV, WD+4 mm); 1.4 nm (1 kV, WD=1.5 mm, deceleration mode); 2.0 nm (1 kV, WD-1.5 mm, normal mode)[2] | — |
| Magnification | LM mode: 20 to 2,000X; HM mode: 100 to 800,000X[2] | — |
| Specimen stage | 5-axis stage motorization; Type KK: X 0 to 110 mm, Y 0 to 110 mm, Z 1.5 to 40 mm, T -5 to +70°, R 360°[2] | — |
| Version | 200 mm Vintage[3] | — |
| Description | FE SEM[3] | — |
| NIST traceability | — | Yes[4] |
Plan your fab
Building a Metrology & Inspection process? Get a complete equipment list.
Open the fab equipment planner →