Waferpedia

Comparison ledger

Spectra G 800versus1000FP

Edwards Spectra G 800, YES 1000FP, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMEdwardsYES
CategoryWet Processing / CleanWet Processing / Clean
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyEdwards Spectra G 800YES 1000FP
Specifications
Configuration4 port inlets[1]—
Phase3 Phase[1]—
Maximum gas flow rate800 slm[2]—
Number of inlet ports1 to 4[2]—
Electrical supply200-208 VAC 3-phase[2]—
Frequency50/60 Hz[2]—
Power consumption4 kW[2]—
Nitrogen supply pressure7 bar[2]—
Fuel gas supply pressure137 mbar (2 psi)[2]—
Extract flow rate60 Nm3/min[2]—
Mass658 Kg[2]—
Combustion stages4-stage[2]—
Number of inlet ports (listing source)4 port inlets[1]—
System type—Plasma cleaning system[3]
Line—R-Series Plasma Cleaning Systems (Glen Technologies)[3]
Model—Glen/YES 1000FP[3]
Designed use—Designed to accept a range of shelf sizes[3]
Application focus—Changing needs of the flat panel industry[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]web.archive.orgweb.archive.org
  3. [3]web.archive.orgweb.archive.org