Comparison ledger
Bruker Dektak 150, Bruker Dektak 8, Bruker Dektak XT, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Dektak 150Bruker | Dektak 8Bruker | Dektak XTBruker |
|---|---|---|---|
| OEM | Bruker | Bruker | Bruker |
| Category | Metrology & Inspection | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — | 2 in, 4 in, 6 in, 8 in |
| Process node | — | — | — |
| Introduced | — | — | — |
| Production run | — | — | — |
| Lifecycle | — | — | — |
| Lifecycle milestones | — | — | — |
| Control system | — | — | — |
| Generation | — | — | — |
| Family | Bruker Dektak | Bruker Dektak | Bruker Dektak |
| Specifications | |||
| Configuration | for parts[1] | Chambers (2)[3] | 4" Stage and movement controlled by software[5] |
| Scan Length | 55mm (2.16in.)[2] | — | — |
| Data Points Per Scan | 60,000 maximum[2] | — | — |
| Step Height Repeatability | 6Å, 1 sigma on 1μm step[2] | — | — |
| Vertical Resolution | 1Å max. (at 6.55μm range)[2] | — | — |
| Max Sample Thickness | Up to 100mm (4in.)[2] | — | — |
| Max Sample Size | 150mm (6in.)[2] | — | — |
| Stage Travel | 100mm (4 inches)[2] | — | — |
| Stage Repeatability | 1μm[2] | — | — |
| Stage Resolution | 0.5μm[2] | — | — |
| Stylus Radius Options | from 50nm to 25μm[2] | — | — |
| Camera | 640 x 480-pixel, manual zoom variable 0.67 to 4.29mm (644X to 100X with 17in. monitor)[2] | — | — |
| Maximum scan length | 55mm (2.16in.)[2] | 50 mm[4] | — |
| Maximum data points per scan | 60,000[2] | — | — |
| Maximum sample thickness | Up to 100mm (4in.)[2] | — | — |
| Maximum sample size | 150mm (6in.)[2] | 8 inches[4] | — |
| Y automatic stage travel | 100mm (4 inches), 1μm repeatability, 0.5μm resolution[2] | — | — |
| Film thickness measurement range | up to 1000μm[2] | — | — |
| Type | — | Contact profilometer[4] | stylus surface profiler[6] |
| Vertical step range | — | Tens of nanometers to 1 mm[4] | — |
| Stylus diameter | — | — | 12.5 Microns[5] |
| Measurement type | — | — | Stylus surface profiler for thin and thick film step height[6] |
| Wafer compatibility | — | — | 2 in, 4 in, 6 in, 8 in[6] |
| Magnification / Field of View | — | — | Selectable 1 to 4 mm FOV[6] |
| Scan length range | — | — | 55 mm (with stitching option)[6] |
| Vertical range | — | — | 1 mm[6] |
| Step-height repeatability | — | — | 5 Å[6] |
| Low force (N-Lite+) | — | — | 0.03 to 15 mg[6] |
| 3D capabilities | — | — | 3D stress and 3D mapping[6] |
| Compatible wafer sizes | — | — | 2", 4", 6", 8"[6] |
| Selectable magnification | — | — | 1 to 4mm FOV[6] |
| N-Lite+ Low Force | — | — | 0.03 to 15mg[6] |
| 3D stress and 3D mapping | — | — | Supported[6] |
| Tool Type | — | — | Stylus surface profiler[6] |
| Wafer Compatibility | — | — | 2″, 4″, 6″, 8″ wafers[6] |
| Field of View Magnification | — | — | Selectable, 1 to 4mm FOV[6] |
| Measurement purpose | — | — | advanced thin and thick film step height measurement[6] |
| Low force mode | — | — | N-Lite+ Low Force with 0.03 to 15mg[6] |
| Measurement modes | — | — | 3D stress and 3D mapping[6] |
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