Comparison ledger
Tokyo Electron NS 300 + Wafer, YES 1000FP, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | NS 300 + WaferTokyo Electron | 1000FPYES |
|---|---|---|
| OEM | Tokyo Electron | YES |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | 8" | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Tokyo Electron NS 300 | YES 1000FP |
| Cited variants |
| — |
| Specifications | ||
| Configuration | 8 chambers[1] | — |
| Wafer size | 8" wafer[1] | — |
| Phase | 1 phase[1] | — |
| Chemicals | TMY[1] | — |
| FOUP | 4[1] | — |
| Power supply | Tel NSPB-E075-Y[1] | — |
| Process Type | Wet process[1] | — |
| Wafer Size | 8 inch[1] | — |
| Number of Chambers | 8[1] | — |
| FOUP Capacity | 4[1] | — |
| Power Supply Model | Tel NSPB-E075-Y[1] | — |
| Phase (NS 300+) | 1 phase[1] | — |
| Phase (NS 300) | 3 phase[3] | — |
| Frequency (NS 300) | 50/60Hz[3] | — |
| OEM | Tokyo Electron[1] | — |
| Model | NS 300 +[1] | Glen/YES 1000FP[4] |
| Tool type | Wafer Scrubber[1] | — |
| Chambers | 8 chambers[1] | — |
| System type | — | Plasma cleaning system[4] |
| Line | — | R-Series Plasma Cleaning Systems (Glen Technologies)[4] |
| Designed use | — | Designed to accept a range of shelf sizes[4] |
| Application focus | — | Changing needs of the flat panel industry[4] |
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