Waferpedia

Comparison ledger

Clean Track Lithius Pro Z i Resistversus1000FP

Tokyo Electron Clean Track Lithius Pro Z i Resist, YES 1000FP, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMTokyo ElectronYES
CategoryWet Processing / CleanWet Processing / Clean
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyTokyo Electron Clean TrackYES 1000FP
Specifications
ConfigurationMulti Block[1]—
T&H ControllerCustomer Provided[1]—
Chemical FilterCustomer Provided[1]—
Ingenio GL LicenseOEM Support/Buyer[1]—
DEVPTD:[1]—
DEV NozzleMGP[1]—
Rinse NozzleADR Nozzles[1]—
NTD NozzleIDN Nozzle[1]—
System type—Plasma cleaning system[2]
Line—R-Series Plasma Cleaning Systems (Glen Technologies)[2]
Model—Glen/YES 1000FP[2]
Designed use—Designed to accept a range of shelf sizes[2]
Application focus—Changing needs of the flat panel industry[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]web.archive.orgweb.archive.org