Comparison ledger
Tokyo Electron Clean Track Act 8, YES 1000P, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Clean Track Act 8Tokyo Electron | 1000PYES |
|---|---|---|
| OEM | Tokyo Electron | YES |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | Interface Unit (IRA) for Canon FPA-3000 i5 stepper including one multi-buffer unit and Wafer edge exposure (WEE) | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | 1997– | — |
| Lifecycle | — | — |
| Lifecycle milestones | 1999 Vintage · 2001 Vintage · 2002 Vintage | 1998 Acquisition |
| Control system | — | — |
| Generation | — | — |
| Family | Tokyo Electron Clean Track | YES 1000P |
| Cited variants | — | |
| Specifications | ||
| Configuration | Single Block[3] | Parallel plate[7] |
| Water Flow | Left to Right[3] | — |
| Wafer size | Interface Unit (IRA) for Canon FPA-3000 i5 stepper including one multi-buffer unit and Wafer edge exposure (WEE)[3] | — |
| Software Version | 1.18.003[4] | — |
| Wafer sizes | 6 inch, 8 inch, 100 mm, 150 mm[2] | — |
| Number of cassette ports | 4 (2 for 100 mm, 2 for 150 mm)[5] | — |
| Spinning units | BCT (bottom coater), COT (coater), DEV (developer)[5] | — |
| Thermal plates | LHP, HHP, HCP, ADH, PHP, TRS, TCP[5] | — |
| Software | TEL GEM, Cascade wafer flow, system log down[3] | — |
| CIM interface | SECS[4] | — |
| Handler system | CRA, PRA[4] | — |
| Factory interface | SMIF[4] | — |
| Interface for stepper | Interface Unit (IRA) for Canon FPA-3000 i5 including multi-buffer and WEE[3] | — |
| OEM | Tokyo Electron[3] | — |
| Model | Clean Track Act 8[3] | 1000P[6] |
| Category hint | Wet Processing / Clean[3] | — |
| Water flow direction | Left to right[3] | — |
| Interface unit | Interface Unit (IRA) for Canon FPA-3000 i5 stepper including one multi-buffer unit and Wafer edge exposure (WEE)[3] | — |
| Temperature & humidity control | Temperature & Humidity control unit for Coater[3] | — |
| Software package | TEL GEM on-line software; Cascade wafer flow software; System log down software[3] | — |
| CIM | SECS[4] | — |
| Block configuration | Dual block - 2C / 2D[2] | — |
| System type | — | Plasma cleaning system[6] |
| Shelf configuration | — | Four 16 x 16 inch shelves[6] |
| Total capacity | — | 1024 square inches[6] |
| Control system | — | PLC driven with plain English real time process readout and diagnostics in the event of system abort[6] |
| Number of shelves | — | 4[6] |
| Shelf size | — | 16 x 16 inches[6] |
| Power | — | 1000 W[7] |
| Operation modes | — | Active, RIE, Downstream[6] |
| Sample size range | — | From smallest semiconductor chip to large flat panels[6] |
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